Method for manufacturing a carbon nanotube multilayer pattern using photolithography and dry etching포토리쏘그래피법과 드라이 에칭법을 이용한 탄소나노튜브 다층막 패턴의 제조방법
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 정희태 | ko |
| dc.contributor.author | 최도환 | ko |
| dc.contributor.author | 정대환 | ko |
| dc.contributor.author | 이재신 | ko |
| dc.contributor.author | 김도현 | ko |
| dc.date.accessioned | 2022-12-21T07:03:23Z | - |
| dc.date.available | 2022-12-21T07:03:23Z | - |
| dc.identifier.uri | http://hdl.handle.net/10203/303432 | - |
| dc.title | Method for manufacturing a carbon nanotube multilayer pattern using photolithography and dry etching | - |
| dc.title.alternative | 포토리쏘그래피법과 드라이 에칭법을 이용한 탄소나노튜브 다층막 패턴의 제조방법 | - |
| dc.type | Patent | - |
| dc.type.rims | PAT | - |
| dc.contributor.localauthor | 정희태 | - |
| dc.contributor.nonIdAuthor | 최도환 | - |
| dc.contributor.nonIdAuthor | 정대환 | - |
| dc.contributor.nonIdAuthor | 이재신 | - |
| dc.contributor.nonIdAuthor | 김도현 | - |
| dc.contributor.assignee | KAIST | - |
| dc.identifier.iprsType | 특허 | - |
| dc.identifier.patentApplicationNumber | 200410085905.X | - |
| dc.identifier.patentRegistrationNumber | 100520586 | - |
| dc.date.application | 2004-10-25 | - |
| dc.date.registration | 2009-07-29 | - |
| dc.publisher.country | CC | - |
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