매우작은소오스영역을갖는자기정렬된수직이중확산형전력MOSFET의제조방법MANUFACTURING METHOD OF SELF-ALIGNED VERTICAL DOUBLE DIFFUSION TYPE WITH VERY SMALL SOURCE REGION

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dc.contributor.author김충기ko
dc.contributor.author고요환ko
dc.date.accessioned2022-11-18T03:06:05Z-
dc.date.available2022-11-18T03:06:05Z-
dc.identifier.urihttp://hdl.handle.net/10203/299967-
dc.description.abstract내용없음-
dc.title매우작은소오스영역을갖는자기정렬된수직이중확산형전력MOSFET의제조방법-
dc.title.alternativeMANUFACTURING METHOD OF SELF-ALIGNED VERTICAL DOUBLE DIFFUSION TYPE WITH VERY SMALL SOURCE REGION-
dc.typePatent-
dc.type.rimsPAT-
dc.contributor.nonIdAuthor고요환-
dc.contributor.assignee한국과학기술원-
dc.identifier.iprsType특허-
dc.identifier.patentApplicationNumber10-1988-0002303-
dc.identifier.patentRegistrationNumber10-0053302-0000-
dc.date.application1988-03-05-
dc.date.registration1992-07-24-
dc.publisher.countryKO-
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