Patterning of single-walled carbon nanotubes and photosensitive polyimides단층 탄소나노튜브와 감광성 폴리이미드의 패턴 형성에 관한 연구

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dc.contributor.advisorJung, Hee-Tae-
dc.contributor.advisor정희태-
dc.contributor.authorJung, Myung-sup-
dc.contributor.author정명섭-
dc.date.accessioned2011-12-13T01:40:46Z-
dc.date.available2011-12-13T01:40:46Z-
dc.date.issued2006-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=301310&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/29032-
dc.description학위논문(박사) - 한국과학기술원 : 생명화학공학과, 2006.8, [ xiv, 154 p. ]-
dc.description.abstractWell-defined and high-density single-walled carbon nanotube (SWNT) patterns were fabricated using a combination of photolithographic and chemical assembling processes. To form the SWNT pattern, the substrate was treated with acid-labile group protected amine, and an amine prepattern was formed using a photolithographic process with a novel polymeric photoacid generator (PAG). The polymeric PAG contains a triphenylsulfonium salt on its backbone and was synthesized to obtain a PAG with enhanced efficiency and ease of spin-coating onto the amine-modified glass substrate. The SWNT monolayer pattern was then formed through the amidation reaction between the carboxylic acid groups of carboxylated SWNTs (ca-SWNTs) and the prepatterned amino groups. A high-density multilayer was fabricated via further repeated reaction between the carboxylic acid groups of the ca-SWNTs and the amino groups of the linker with the aid of a condensation agent. Unlike previously reported patterned SWNT arrays, this ca-SWNT patterned layer has high surface density and excellent surface adhesion due to its direct chemical bonding to the substrate. Well-defined polyimide patterns were also fabricated by the preparation of a chemically amplified photosensitive polyimide (PSPI). The positive-working PSPI developable with basic aqueous solutions was obtained from poly(amic acid ethoxymethyl ester) (PAAE) as a polyimide precursor and diphenyliodonium 5-hydroxynaphthalene-1-sulfonate (DINS) as a photo acid generator. The acid generated from DINS in the UV exposed region effectively deprotects the ethoxymethyl groups of PAAE by a chemical amplification mechanism. The resolution of the PSPI is excellent compared to those previously reported for chemically amplified PSPIs, and such a film can thus be used as a buffer coating in semiconductor packaging.eng
dc.languageeng-
dc.publisher한국과학기술원-
dc.subjectcarbon nanotubes-
dc.subjectphotolithography-
dc.subjectphotosensitive polyimide-
dc.subject카본나노튜브-
dc.subject포토리쏘그라피-
dc.subject감광성 폴리이미드-
dc.subjectcarbon nanotubes-
dc.subjectphotolithography-
dc.subjectphotosensitive polyimide-
dc.subject카본나노튜브-
dc.subject포토리쏘그라피-
dc.subject감광성 폴리이미드-
dc.titlePatterning of single-walled carbon nanotubes and photosensitive polyimides-
dc.title.alternative단층 탄소나노튜브와 감광성 폴리이미드의 패턴 형성에 관한 연구-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN301310/325007 -
dc.description.department한국과학기술원 : 생명화학공학과, -
dc.identifier.uid020015868-
dc.contributor.localauthorJung, Hee-Tae-
dc.contributor.localauthor정희태-
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