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Universal Patterning for 2D Van der Waals Materials via Direct Optical Lithography

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dc.contributor.authorCho, Seong Raeko
dc.contributor.authorAhn, Seonghunko
dc.contributor.authorLee, Seung Hyungko
dc.contributor.authorHa, Heonhakko
dc.contributor.authorKim, Tae Sooko
dc.contributor.authorJo, Min-kyungko
dc.contributor.authorSong, Chanwooko
dc.contributor.authorIm, Tae Hongko
dc.contributor.authorRani, Pragyako
dc.contributor.authorGyeon, Minseungko
dc.contributor.authorCho, Kiwonko
dc.contributor.authorSong, Seungwooko
dc.contributor.authorJang, Min Seokko
dc.contributor.authorCho, Yong-Hoonko
dc.contributor.authorLee, Keon Jaeko
dc.contributor.authorKang, Kibumko
dc.date.accessioned2021-11-21T06:41:46Z-
dc.date.available2021-11-21T06:41:46Z-
dc.date.created2021-08-31-
dc.date.created2021-08-31-
dc.date.created2021-08-31-
dc.date.created2021-08-31-
dc.date.created2021-08-31-
dc.date.issued2021-08-
dc.identifier.citationADVANCED FUNCTIONAL MATERIALS, v.31, no.47-
dc.identifier.issn1616-301X-
dc.identifier.urihttp://hdl.handle.net/10203/289297-
dc.description.abstractAdvanced patterning techniques are essential to pursue applications of 2D van der Waals (vdW) materials in electrical and optical devices. Here, the direct optical lithography (DOL) of vdW materials by single-pulse irradiation of high-power light through a photomask is reported. The DOL exhibits large-scale patterning with a sub-micrometer resolution and clean surface, which can be applied to various combinations of vdW materials and substrates. In addition, the thermal profile during DOL is investigated using the finite element method, and the ideal conditions of DOL according to the materials and substrates are determined.-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.titleUniversal Patterning for 2D Van der Waals Materials via Direct Optical Lithography-
dc.typeArticle-
dc.identifier.wosid000686919000001-
dc.identifier.scopusid2-s2.0-85113158327-
dc.type.rimsART-
dc.citation.volume31-
dc.citation.issue47-
dc.citation.publicationnameADVANCED FUNCTIONAL MATERIALS-
dc.identifier.doi10.1002/adfm.202105302-
dc.contributor.localauthorJang, Min Seok-
dc.contributor.localauthorCho, Yong-Hoon-
dc.contributor.localauthorLee, Keon Jae-
dc.contributor.localauthorKang, Kibum-
dc.contributor.nonIdAuthorSong, Chanwoo-
dc.contributor.nonIdAuthorRani, Pragya-
dc.contributor.nonIdAuthorCho, Kiwon-
dc.contributor.nonIdAuthorSong, Seungwoo-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthormulti-scale-
dc.subject.keywordAuthoroptical lithography-
dc.subject.keywordAuthorpatterning-
dc.subject.keywordAuthorphotoresist-free-
dc.subject.keywordAuthorvan der Waals materials-
dc.subject.keywordPlusMOS2-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusMONOLAYER-
dc.subject.keywordPlusGRAPHENE-
dc.subject.keywordPlusTRANSITIONS-
dc.subject.keywordPlusSTABILITY-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusDEVICE-
dc.subject.keywordPlusVAPOR-
dc.subject.keywordPlusFILMS-
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EE-Journal Papers(저널논문)PH-Journal Papers(저널논문)MS-Journal Papers(저널논문)
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