DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Kim, Hee-Tak | - |
dc.contributor.advisor | 김희탁 | - |
dc.contributor.author | Choi, Jae Ho | - |
dc.date.accessioned | 2021-05-11T19:42:13Z | - |
dc.date.available | 2021-05-11T19:42:13Z | - |
dc.date.issued | 2020 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=901583&flag=dissertation | en_US |
dc.identifier.uri | http://hdl.handle.net/10203/283497 | - |
dc.description | 학위논문(박사) - 한국과학기술원 : 생명화학공학과, 2020.2,[vi, 90 p. :] | - |
dc.description.abstract | Azobenzene polymers exhibit extraordinary molecular behavior upon light irradiation. For example, when linearly polarized light is irradiated, the azobenzene molecules are aligned in a direction perpendicular to the polarization as they undergo repeated/reversible trans-cis-trans isomerization cycling. Interestingly, the light-responsive molecular behavior results in macroscopic behavior of azobenzene polymer, called directional photo-fluidization. The rep-resentative characteristic of the behavior is that the azobenzene polymer behaves like fluid even below its $T_g/T_m$ under irradiation. More importantly, the photofluidic mass-migration is anisotropic in a direction parallel to the light polarization. Such polarization-dependent, flu-idic movement can be usefully used in various applications ranging from mi-cro/nanostructuring to superomniphobic surface. This thesis is classified in 6 main parts. In Chapter 1, azobenzene polymers and their light-responsive behaviors are presented as follows: i) the light-responsive molecular behav-ior of azobenzene molecules, ii) the light-responsive macroscopic behavior of azobenzene polymer (i.e. the directional photofluidic behavior of azobenzene polymer), and iii) the rele-vant applications in macro/nano-fabrication (i.e. directional photofluidization lithography). In Chapter 2, the development of heat-free, solvent-free and curing-free imprint lithography that is enabled by an important discover of vertical-directional photofluidization is present-ed. In Chapter 3, an efficient way to transfer micro/nano-patterns to functional material (i.e. silicon wafer) is presented, where it exploits azobenzene polymer as etch-mask that produce diverse patterns ranging from few microns to 100 nm with vertical sidewall profile. In Chapter 4, a pragmatic method creating polymeric mushroom-structures that produce flexi-ble and robust superomniphobic surface is discussed. In Chapter 5, the development of alumina-patterning method that provide structural reconfigurability and fab-simplicity is presented. Finally, in Chapter 6, brief summary of this thesis is presented.. | - |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | Azobenzene polymer▼aDirectional Photofluidization▼aMicro/nanofabrication▼aSuperomniphobic surface | - |
dc.subject | 아조고분자▼a방향성을 갖는 광유체화 현상▼a미세구조체 제작▼a초소수성/초소유성 표면 | - |
dc.title | Photo-fluidic behavior of azopolymer toward micro/nano patterning and robust superomniphobic surface | - |
dc.title.alternative | 아조고분자의 광유체이동현상을 이용한 주기적 미세 구조체 및 초소수성/초소유성 표면의 제작 | - |
dc.type | Thesis(Ph.D) | - |
dc.identifier.CNRN | 325007 | - |
dc.description.department | 한국과학기술원 :생명화학공학과, | - |
dc.contributor.alternativeauthor | 최재호 | - |
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