Characterization of Subgap Density-of-States by Sub-Bandgap Optical Charge Pumping in In0.53Ga0.47As Metal-Oxide-Semiconductor Field-Effect Transistors

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dc.contributor.authorYoo, Han Binko
dc.contributor.authorKim, Seong Kwangko
dc.contributor.authorKim, Junyeapko
dc.contributor.authorYu, Jintaeko
dc.contributor.authorChoi, Sung-Jinko
dc.contributor.authorKim, Dae Hwanko
dc.contributor.authorKim, Dong Myongko
dc.date.accessioned2021-03-26T02:54:55Z-
dc.date.available2021-03-26T02:54:55Z-
dc.date.created2020-02-10-
dc.date.issued2020-07-
dc.identifier.citationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.20, no.7, pp.4287 - 4291-
dc.identifier.issn1533-4880-
dc.identifier.urihttp://hdl.handle.net/10203/281998-
dc.description.abstractWe report an experimental characterization of the interface states (D-it(E)) by using the subthreshold drain current with optical charge pumping effect in In0.53Ga0.47As metal-oxide-semiconductor field-effect transistors (MOSFETs). The interface states are derived from the difference between the dark and photo states of the current-voltage characteristics. We used a sub-bandgap photon (i.e., with the photon energy lower than the bandgap energy, E-ph < E-g) to optically excite trapped carriers over the bandgap in In0.53Ga0.47As MOSFETs. We combined a gate bias-dependent capacitance model to determine the channel length-independent oxide capacitance. Then, we estimated the channel length-independent interface states in In0.53Ga0.47As MOSFETs having different channel lengths (L-ch = 5, 10, and 25 [mu m]) for a fixed overlap length (L-ov = 5 [mu m]).-
dc.languageEnglish-
dc.publisherAMER SCIENTIFIC PUBLISHERS-
dc.titleCharacterization of Subgap Density-of-States by Sub-Bandgap Optical Charge Pumping in In0.53Ga0.47As Metal-Oxide-Semiconductor Field-Effect Transistors-
dc.typeArticle-
dc.identifier.wosid000508646300051-
dc.type.rimsART-
dc.citation.volume20-
dc.citation.issue7-
dc.citation.beginningpage4287-
dc.citation.endingpage4291-
dc.citation.publicationnameJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY-
dc.identifier.doi10.1166/jnn.2020.17785-
dc.contributor.nonIdAuthorYoo, Han Bin-
dc.contributor.nonIdAuthorKim, Junyeap-
dc.contributor.nonIdAuthorYu, Jintae-
dc.contributor.nonIdAuthorChoi, Sung-Jin-
dc.contributor.nonIdAuthorKim, Dae Hwan-
dc.contributor.nonIdAuthorKim, Dong Myong-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorMOSFET-
dc.subject.keywordAuthorInterface State-
dc.subject.keywordAuthorOptical Charge Pumping-
dc.subject.keywordAuthorIdeality Factor-
dc.subject.keywordAuthorOverlap Capacitance-
dc.subject.keywordPlusINTERFACE-
dc.subject.keywordPlusEXTRACTION-
dc.subject.keywordPlusDOS-
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