Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

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Directed self-assembly (DSA) of block copolymer (BCP) thin films is of particular interest in nanoscience and nanotechnology due to its superior ability to form various well-aligned nanopatterns. Herein, nanoscratch-DSA is introduced as a simple and scalable DSA strategy allowing highly aligned BCP nanopatterns over a large area. A gentle scratching on the target substrate with a commercial diamond lapping film can form uniaxially aligned nanoscratches. As applied in BCP thin films, the nanoscratch effectively guides the self-assembly of overlying BCPs and provides highly aligned nanopatterns along the direction of the nanoscratch. The nanoscratch-DSA is not material-specific, allowing more versatile nanofabrication for various functional nanomaterials. In addition, we demonstrate that the nanoscratch-DSA can be utilized as a direction-controllable and area-selective nanofabrication method.
Publisher
AMER CHEMICAL SOC
Issue Date
2021-02
Language
English
Article Type
Article
Citation

ACS APPLIED MATERIALS & INTERFACES, v.13, no.4, pp.5772 - 5781

ISSN
1944-8244
DOI
10.1021/acsami.0c19665
URI
http://hdl.handle.net/10203/281648
Appears in Collection
CH-Journal Papers(저널논문)
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