Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

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dc.contributor.authorKim, Dong Hyupko
dc.contributor.authorSuh, Ahramko
dc.contributor.authorPark, Geonhyeongko
dc.contributor.authorYoon, Dong Kiko
dc.contributor.authorKim, So Younko
dc.date.accessioned2021-03-17T08:10:09Z-
dc.date.available2021-03-17T08:10:09Z-
dc.date.created2021-03-17-
dc.date.created2021-03-17-
dc.date.issued2021-02-
dc.identifier.citationACS APPLIED MATERIALS & INTERFACES, v.13, no.4, pp.5772 - 5781-
dc.identifier.issn1944-8244-
dc.identifier.urihttp://hdl.handle.net/10203/281648-
dc.description.abstractDirected self-assembly (DSA) of block copolymer (BCP) thin films is of particular interest in nanoscience and nanotechnology due to its superior ability to form various well-aligned nanopatterns. Herein, nanoscratch-DSA is introduced as a simple and scalable DSA strategy allowing highly aligned BCP nanopatterns over a large area. A gentle scratching on the target substrate with a commercial diamond lapping film can form uniaxially aligned nanoscratches. As applied in BCP thin films, the nanoscratch effectively guides the self-assembly of overlying BCPs and provides highly aligned nanopatterns along the direction of the nanoscratch. The nanoscratch-DSA is not material-specific, allowing more versatile nanofabrication for various functional nanomaterials. In addition, we demonstrate that the nanoscratch-DSA can be utilized as a direction-controllable and area-selective nanofabrication method.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.titleNanoscratch-Directed Self-Assembly of Block Copolymer Thin Films-
dc.typeArticle-
dc.identifier.wosid000618153100098-
dc.identifier.scopusid2-s2.0-85100260690-
dc.type.rimsART-
dc.citation.volume13-
dc.citation.issue4-
dc.citation.beginningpage5772-
dc.citation.endingpage5781-
dc.citation.publicationnameACS APPLIED MATERIALS & INTERFACES-
dc.identifier.doi10.1021/acsami.0c19665-
dc.contributor.localauthorYoon, Dong Ki-
dc.contributor.nonIdAuthorKim, Dong Hyup-
dc.contributor.nonIdAuthorKim, So Youn-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorblock copolymers-
dc.subject.keywordAuthorself-assembly-
dc.subject.keywordAuthorthin films-
dc.subject.keywordAuthordirected self-assembly-
dc.subject.keywordAuthornanopatterning-
dc.subject.keywordAuthornanoscratch-
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