Pattern structure inspection device and inspection method패턴 구조물 검사 장치 및 검사 방법

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According to an aspect of the present invention, there is provided a pattern structure inspection method including irradiating a wave from a wave source onto a sample including a pattern region in which a structure having a certain pattern is provided on a substrate, collecting speckle data generated due to multiple scattering of the wave in the pattern region, by using a data collector, and analyzing whether the structure of the pattern region has a defect, by comparing the collected speckle data to reference speckle data.
Assignee
KAIST
Country
US (United States)
Application Date
2017-06-01
Application Number
16305982
Registration Date
2020-12-01
Registration Number
10852246
URI
http://hdl.handle.net/10203/279032
Appears in Collection
PH-Patent(특허)
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