DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Yong Keun | ko |
dc.contributor.author | Park, Jongchan | ko |
dc.contributor.author | Kim, Young Dug | ko |
dc.date.accessioned | 2020-12-23T12:52:30Z | - |
dc.date.available | 2020-12-23T12:52:30Z | - |
dc.identifier.uri | http://hdl.handle.net/10203/279032 | - |
dc.description.abstract | According to an aspect of the present invention, there is provided a pattern structure inspection method including irradiating a wave from a wave source onto a sample including a pattern region in which a structure having a certain pattern is provided on a substrate, collecting speckle data generated due to multiple scattering of the wave in the pattern region, by using a data collector, and analyzing whether the structure of the pattern region has a defect, by comparing the collected speckle data to reference speckle data. | - |
dc.title | Pattern structure inspection device and inspection method | - |
dc.title.alternative | 패턴 구조물 검사 장치 및 검사 방법 | - |
dc.type | Patent | - |
dc.type.rims | PAT | - |
dc.contributor.localauthor | Park, Yong Keun | - |
dc.contributor.nonIdAuthor | Kim, Young Dug | - |
dc.contributor.assignee | KAIST | - |
dc.identifier.iprsType | 특허 | - |
dc.identifier.patentApplicationNumber | 16305982 | - |
dc.identifier.patentRegistrationNumber | 10852246 | - |
dc.date.application | 2017-06-01 | - |
dc.date.registration | 2020-12-01 | - |
dc.publisher.country | US | - |
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