Dry etching of colloidal crystal films

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dc.contributor.authorCho, Young-Sangko
dc.contributor.authorYi, Gi-Rako
dc.contributor.authorMoon, Jun Hyukko
dc.contributor.authorKim, Dae-Chulko
dc.contributor.authorLee, Bong-Juko
dc.contributor.authorYang, Seung-Manko
dc.date.accessioned2011-11-22T02:02:10Z-
dc.date.available2011-11-22T02:02:10Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2010-01-
dc.identifier.citationJOURNAL OF COLLOID AND INTERFACE SCIENCE, v.341, no.2, pp.209 - 214-
dc.identifier.issn0021-9797-
dc.identifier.urihttp://hdl.handle.net/10203/25713-
dc.description.abstractTwo types of non-close-packed colloidal crystal films were prepared by etching the films made of polystyrene nanospheres using a hyperthermal neutral beam of oxygen gas. Etching without sintering above glass transition temperature of the polymer particles resulted in the non-close-packed structure of the nanospheres, in which polystyrene nanospheres in different lattice planes touched each other due to the reduction in the size of the nanospheres that Occurred during the etching process. In contrast, a different non-close-packed structure with inter-connecting networks between etched nanospheres was generated by annealing of the colloidal crystal and a subsequent etching process. The photonic bandgap could be tuned during this dry etching of colloidal photonic crystals. This connected open structure Could be used as a template for a silica inverse opal by chemical vapor deposition. An alternative dry etching process, reactive ion etching, mainly affected the morphology of particles near the top surface, and only a slight change in the stop band position of the colloidal crystal film was observed. (C) 2009 Elsevier Inc. All rights reserved.-
dc.description.sponsorshipWe thank to Su Yeon Lee and Woo-Min Jin for measurement of optical spectrum. Y.S.C. and S.M.Y. thank a grant from the Creative Research Initiative Program of the Ministry of Science and Technology for ‘‘Complementary Hybridization of Optical and Fluidic Devices for Integrated Optofluidic Systems”. J.H.M. thanks the supports by the Sogang University Research Grant of 2008, the Manpower Development Program for Energy and Resources of the Ministry of Knowledge and Economy (2008-E-AP-HM-P-23- 0000) and the Korea Research Foundation Grant (KRF-2008-313- D00295). GRY thanks the support by KBSI Grant (N27073) and small and medium business administration (S1025323). The Korea Basic Science Institute (KBSI) is also acknowledged for SEM measurement.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherACADEMIC PRESS INC ELSEVIER SCIENCE-
dc.subjectPHOTONIC CRYSTALS-
dc.subjectOPTICAL-PROPERTIES-
dc.subjectFABRICATION-
dc.subjectIRRADIATION-
dc.subjectPARTICLES-
dc.subjectBEAM-
dc.titleDry etching of colloidal crystal films-
dc.typeArticle-
dc.identifier.wosid000272588100002-
dc.identifier.scopusid2-s2.0-70449670308-
dc.type.rimsART-
dc.citation.volume341-
dc.citation.issue2-
dc.citation.beginningpage209-
dc.citation.endingpage214-
dc.citation.publicationnameJOURNAL OF COLLOID AND INTERFACE SCIENCE-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorYang, Seung-Man-
dc.contributor.nonIdAuthorYi, Gi-Ra-
dc.contributor.nonIdAuthorKim, Dae-Chul-
dc.contributor.nonIdAuthorLee, Bong-Ju-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorColloidal crystal-
dc.subject.keywordAuthorHyperthermal neutral beam-
dc.subject.keywordAuthorReactive ion etching-
dc.subject.keywordAuthorPhotonic bandgap-
dc.subject.keywordPlusPHOTONIC CRYSTALS-
dc.subject.keywordPlusOPTICAL-PROPERTIES-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusIRRADIATION-
dc.subject.keywordPlusPARTICLES-
dc.subject.keywordPlusBEAM-
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