Effects of O-vacancy defects, hydrogenation, thermal annealing, and electric fields on the stability of oxide-based thin-film transistors

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 190
  • Download : 0
Publisher
ICAE
Issue Date
2013-11
Language
English
Citation

The 2nd International Conference on Advanced Electromaterials

URI
http://hdl.handle.net/10203/256580
Appears in Collection
PH-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0