Effects of O-vacancy defects, hydrogenation, thermal annealing, and electric fields on the stability of oxide-based thin-film transistors

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dc.contributor.authorNoh, Hyeon-Kyunko
dc.contributor.authorOh, Young Junko
dc.contributor.authorChang, Kee-Jooko
dc.date.accessioned2019-04-15T17:30:18Z-
dc.date.available2019-04-15T17:30:18Z-
dc.date.created2014-01-12-
dc.date.issued2013-11-
dc.identifier.citationThe 2nd International Conference on Advanced Electromaterials-
dc.identifier.urihttp://hdl.handle.net/10203/256580-
dc.languageEnglish-
dc.publisherICAE-
dc.titleEffects of O-vacancy defects, hydrogenation, thermal annealing, and electric fields on the stability of oxide-based thin-film transistors-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameThe 2nd International Conference on Advanced Electromaterials-
dc.identifier.conferencecountryKO-
dc.contributor.localauthorChang, Kee-Joo-
dc.contributor.nonIdAuthorNoh, Hyeon-Kyun-
dc.contributor.nonIdAuthorOh, Young Jun-
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PH-Conference Papers(학술회의논문)
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