Thin film encapsulation for organic light emitting diodes using a multi-barrier composed of MgO prepared by atomic layer deposition and hybrid materials

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dc.contributor.authorKim, Eungtaekko
dc.contributor.authorHan, Yuncheolko
dc.contributor.authorKim, Woohyunko
dc.contributor.authorChoi, Kyung Cheolko
dc.contributor.authorIm, Hyeon-Gyunko
dc.contributor.authorBae, Byeong-Sooko
dc.date.accessioned2019-04-15T15:12:43Z-
dc.date.available2019-04-15T15:12:43Z-
dc.date.created2013-06-27-
dc.date.issued2013-07-
dc.identifier.citationORGANIC ELECTRONICS, v.14, no.7, pp.1737 - 1743-
dc.identifier.issn1566-1199-
dc.identifier.urihttp://hdl.handle.net/10203/254784-
dc.description.abstractWe demonstrated an organic/inorganic multi-barrier and encapsulation for flexible OLED devices. The multi-barrier consisted of a silica nanoparticle-embedded hybrid nanocomposite, in short, S-H nanocomposite, and MgO, which were used as organic and inorganic materials, respectively. The S-H nanocomposite was spin-coated followed by UV curing. The thickness of the S-H nanocomposite was 200 nm, and 40 nm of MgO was deposited by atomic layer deposition (ALD) using Mg(CpEt)(2) and H2O at 70 degrees C. The results of a Ca test showed that the 4.5 dyads of the MgO/S-H nanocomposite had a low water vapor transmission rate (WVTR) of 4.33 x 10(-6) g/m(2)/day and an optical transmittance of 84%. The normalized luminance degradation of the thin film encapsulated OLED was also identical to that of glass-lid encapsulation after 1000 h of the real operation time. We proposed low temperature ALD as a deposition method to create relatively thin film for OLED passivation without degradation, such as creation of dark spots. The results confirmed that it may be feasible for our multi-barrier to passivate flexible OLEDs devices. (C) 2013 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.subjectPERMEATION-
dc.subjectDISPLAYS-
dc.subjectDEVICES-
dc.titleThin film encapsulation for organic light emitting diodes using a multi-barrier composed of MgO prepared by atomic layer deposition and hybrid materials-
dc.typeArticle-
dc.identifier.wosid000319503600006-
dc.identifier.scopusid2-s2.0-84877271764-
dc.type.rimsART-
dc.citation.volume14-
dc.citation.issue7-
dc.citation.beginningpage1737-
dc.citation.endingpage1743-
dc.citation.publicationnameORGANIC ELECTRONICS-
dc.identifier.doi10.1016/j.orgel.2013.04.011-
dc.contributor.localauthorChoi, Kyung Cheol-
dc.contributor.localauthorBae, Byeong-Soo-
dc.contributor.nonIdAuthorIm, Hyeon-Gyun-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorThin film encapsulation-
dc.subject.keywordAuthorMulti-barrier-
dc.subject.keywordAuthorALD-
dc.subject.keywordAuthorMgO-
dc.subject.keywordAuthorS-H nanocomposite-
dc.subject.keywordAuthorOLEDs-
dc.subject.keywordPlusPERMEATION-
dc.subject.keywordPlusDISPLAYS-
dc.subject.keywordPlusDEVICES-
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EE-Journal Papers(저널논문)MS-Journal Papers(저널논문)
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