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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Effect of activation of oxygen by electron cyclotron resonance plasma on the incorporation of Pb in the deposition of Pb(Zr,Ti)O-3 films by DC magnetron reactive sputtering

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dc.contributor.authorKim, STko
dc.contributor.authorKim, HHko
dc.contributor.authorKim, YIko
dc.contributor.authorLee, MYko
dc.contributor.authorLee, Won-Jongko
dc.date.accessioned2011-09-19T07:38:35Z-
dc.date.available2011-09-19T07:38:35Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1997-09-
dc.identifier.citationJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.36, no.9A, pp.5663 - 5669-
dc.identifier.urihttp://hdl.handle.net/10203/25235-
dc.description.abstractPb(Zr,Ti)O-3 films were deposited by DC magnetron reactive sputtering on Pt/Ti/SiO2/Si and Pt/SiO2/Si substrates. The activation of oxygen by electron cyclotron resonance (ECR) plasma facilitated the incorporation of Pb. This enabled the fabrication of Pb(Zr,Ti)O-3 films With stoichiometric composition and perovskite structure even at a high Zr/Ti film concentration ratio and high substrate temperature and on Pt/SiO2/Si substrates where the pyrochlore second phase was usually observed when the films were deposited without oxygen activation.-
dc.description.sponsorshipThe authors acknowledge the support of Samsung Electronics Co., Ltd. in this research.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherJAPAN J APPLIED PHYSICS-
dc.titleEffect of activation of oxygen by electron cyclotron resonance plasma on the incorporation of Pb in the deposition of Pb(Zr,Ti)O-3 films by DC magnetron reactive sputtering-
dc.typeArticle-
dc.identifier.wosidA1997YE80400053-
dc.identifier.scopusid2-s2.0-0031220601-
dc.type.rimsART-
dc.citation.volume36-
dc.citation.issue9A-
dc.citation.beginningpage5663-
dc.citation.endingpage5669-
dc.citation.publicationnameJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS-
dc.identifier.doi10.1143/JJAP.36.5663-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorLee, Won-Jong-
dc.contributor.nonIdAuthorKim, ST-
dc.contributor.nonIdAuthorKim, HH-
dc.contributor.nonIdAuthorKim, YI-
dc.contributor.nonIdAuthorLee, MY-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorlead zirconate titanate-
dc.subject.keywordAuthorthin film-
dc.subject.keywordAuthorsputtering-
dc.subject.keywordAuthorECR plasma-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusPB(ZR-
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