Improvements in electrical properties of (Ba,Sr)TiO3 capacitor with chemical vapor deposited Pt top electrode using Pt hexafluoroacetylacetonate

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dc.contributor.authorLee, Jong Myeongko
dc.contributor.authorKang, Sang Yeolko
dc.contributor.authorShin, Ju Cheolko
dc.contributor.authorKim, Wonjoonko
dc.contributor.authorHwang, Cheol Seongko
dc.contributor.authorKim, Hyeong Joonko
dc.date.accessioned2019-03-07T20:32:30Z-
dc.date.available2019-03-07T20:32:30Z-
dc.date.created2012-02-06-
dc.date.issued1999-06-
dc.identifier.citationAPPLIED PHYSICS LETTERS, v.74, no.23, pp.3489 - 3491-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10203/250977-
dc.description.abstractElectrical properties of (Bs,Sr)TiO3 (BST) thin films are characterized with sputtered and metal organic chemical vapor deposited (MOCVD) Pt top electrodes. BST films with MOCVD Pt top electrodes, which were deposited using Pt(CF3COCHCOCF3)(2) (Pt-HFA) as a precursor, showed less leakage current without bulged curves and a higher dielectric constant than those with sputtered Pt top electrodes. The improvement of electrical properties seems to result from the reduction of interface trap sites with the incorporation of fluorine atoms from HFA ligands. (C) 1999 American Institute of Physics. [S0003-6951(99)00623-3].-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectTHIN-FILMS-
dc.subjectBREAKDOWN-
dc.subjectOXIDE-
dc.titleImprovements in electrical properties of (Ba,Sr)TiO3 capacitor with chemical vapor deposited Pt top electrode using Pt hexafluoroacetylacetonate-
dc.typeArticle-
dc.identifier.wosid000080519000021-
dc.identifier.scopusid2-s2.0-0000376458-
dc.type.rimsART-
dc.citation.volume74-
dc.citation.issue23-
dc.citation.beginningpage3489-
dc.citation.endingpage3491-
dc.citation.publicationnameAPPLIED PHYSICS LETTERS-
dc.identifier.doi10.1063/1.124139-
dc.contributor.localauthorKim, Wonjoon-
dc.contributor.nonIdAuthorLee, Jong Myeong-
dc.contributor.nonIdAuthorKang, Sang Yeol-
dc.contributor.nonIdAuthorShin, Ju Cheol-
dc.contributor.nonIdAuthorHwang, Cheol Seong-
dc.contributor.nonIdAuthorKim, Hyeong Joon-
dc.type.journalArticleArticle-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusBREAKDOWN-
dc.subject.keywordPlusOXIDE-
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