DC Field | Value | Language |
---|---|---|
dc.contributor.author | Oh, Ji-Hoon | ko |
dc.contributor.author | Kwak, Seung-Yeon | ko |
dc.contributor.author | Yang, Seung-Cheol | ko |
dc.contributor.author | Bae, Byeong-Soo | ko |
dc.date.accessioned | 2011-09-05T01:08:07Z | - |
dc.date.available | 2011-09-05T01:08:07Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2010-03 | - |
dc.identifier.citation | ACS APPLIED MATERIALS & INTERFACES, v.2, no.3, pp.913 - 918 | - |
dc.identifier.issn | 1944-8244 | - |
dc.identifier.uri | http://hdl.handle.net/10203/25084 | - |
dc.description.abstract | Photocurable and highly condensed fluorinated methacrylate oligosiloxane, with a low dielectric constant (k = 2,54), was prepared by a nonhydrolytic sol-gel condensation reaction. The oligosiloxane resin was then spin-coated, photocured, and thermally baked in order to fabricate a fluorinated methacrylate hybrid material (FM hybrimer) thin him. This study investigated the application of this FM hybrimer film as a low-k passivation layer in LCD-based thin film transistors (TFT). It was found that a dielectric constant as low as k = 2.54 could be obtained, without introducing pores in the dense FM hybrimer films. This study compares FM hybrimer film characteristics with those required for passivation layers in LCD-TFTs, including thermal stability, optical transmittance, hydrophobicity, gap fill, and planarization effects as well as electrical insulation. | - |
dc.description.sponsorship | This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (R11-2007-045-03002-0(2009)and R01-2007-000-20815-0(2009)). The authors gratefully thank the Korea Basic Science Institute for NMR spectra measurements. | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | Amer Chemical Soc | - |
dc.subject | THIN-FILM TRANSISTORS | - |
dc.subject | SI-29 NMR | - |
dc.subject | FABRICATION | - |
dc.subject | MOLECULES | - |
dc.title | Highly Condensed Fluorinated Methacrylate Hybrid Material for Transparent Low-k Passivation Layer in LCD-TFT | - |
dc.type | Article | - |
dc.identifier.wosid | 000275825700046 | - |
dc.identifier.scopusid | 2-s2.0-79151470528 | - |
dc.type.rims | ART | - |
dc.citation.volume | 2 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 913 | - |
dc.citation.endingpage | 918 | - |
dc.citation.publicationname | ACS APPLIED MATERIALS & INTERFACES | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Bae, Byeong-Soo | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | LCD-TFT passivation layer | - |
dc.subject.keywordAuthor | low k | - |
dc.subject.keywordAuthor | high transparency | - |
dc.subject.keywordAuthor | solution-based process | - |
dc.subject.keywordAuthor | organic-inorganic hybrid material | - |
dc.subject.keywordPlus | THIN-FILM TRANSISTORS | - |
dc.subject.keywordPlus | SI-29 NMR | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | MOLECULES | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.