UHV-TPD study of NO adsorption/reaction over Cu/ZSM-5

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The chemisorption state of NO adsorbed on Cu/ZSM-5 was investigated by the TPD method in an UHV system and was discussed to be correlated with the NO decomposition mechanism. The three distinct states of NO adsorbed on Cu/ZSM-5 (T-ad = 175 K) are indicated by the appearance of the peaks at 210 (alpha), 330 K (beta) and 480 K (gamma) with increasing exposure. It is found that the beta peak is attributable to NO adsorbed on Cu+ ions, while the cu peak is assigned to NO physically adsorbed on support. At high exposure pressure, a new peak is developed and N-2 and N2O are produced during TPD, suggesting that a dinitrosyl species as an intermediate species for NO decomposition is formed. (C) 1997 Elsevier Science B.V.
Publisher
ELSEVIER SCIENCE BV
Issue Date
1997-11
Language
English
Article Type
Article; Proceedings Paper
Keywords

THERMAL-DESORPTION; NITRIC-OXIDE; AREA SOLIDS; NAX-ZEOLITE; SURFACE; DECOMPOSITION; SPECTROSCOPY; CATALYST; EPR

Citation

APPLIED SURFACE SCIENCE, v.121, pp.310 - 313

ISSN
0169-4332
URI
http://hdl.handle.net/10203/250704
Appears in Collection
CBE-Journal Papers(저널논문)
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