DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kwon, Ui Hui | - |
dc.contributor.author | Lee, Won Jong | - |
dc.date.accessioned | 2011-09-01T02:39:50Z | - |
dc.date.available | 2011-09-01T02:39:50Z | - |
dc.date.issued | 2006-11-08 | - |
dc.identifier.citation | Japanese Journal of Applied Physics, Vol.45, No.11, pp.8629-8638 | en |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | http://hdl.handle.net/10203/25068 | - |
dc.description.abstract | We present an experimental and computational study of the effect of magnetron design on the target erosion profile, wafer-level deposition uniformity, and feature-scale deposition topography in a circular DC magnetron sputtering system. We have conducted a multiscale Monte Carlo simulation consisting of a particle-in-cell Monte Carlo collision plasma simulation for target sputter erosion, a collisional transport simulation for film deposition, and a feature-scale deposition topography simulation. The entire simulation results for each step are verified in comparison with the experimental results for various process conditions. A new semiempirical calibration method, for converting an estimated ion current density distribution into a target erosion profile, is proposed with regard to the gas rarefaction effect due to sputtering wind. In conclusion, the whole performance indices of a circular DC magnetron sputtering system are substantially influenced by magnetron design, and the effectiveness of our multiscale Monte Carlo simulation methodology is validated. | en |
dc.description.sponsorship | This work was supported by the Center for Electronic Packaging Materials (ERC) of the MOST/KOSEF (grant #:R11-2000-085-06002-0). | en |
dc.language.iso | en_US | en |
dc.publisher | Japan Society of Applied Physics | en |
dc.subject | magnetron sputtering | en |
dc.subject | Monte Carlo simulation | en |
dc.subject | erosion | en |
dc.subject | topography | en |
dc.subject | deposition | en |
dc.title | Multi-scale Monte Carlo Simulation of a Circular DC Magnetron Sputtering : Influence of Magnetron Design on Target Erosion and Film Deposition | en |
dc.type | Article | en |
dc.identifier.doi | 10.1143/JJAP.45.8629 | - |
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