Self-assembly is an effective strategy for the creation of periodic structures at
the nanoscale. However, because microelectronic devices use free-form design
principles, the insertion point of self-assembling materials into existing nanomanufacturing
processes is unclear. We directed ternary blends of diblock
copolymers and homopolymers that naturally form periodic arrays to assemble
into nonregular device-oriented structures on chemically nanopatterned
substrates. Redistribution of homopolymer facilitates the defect-free assembly
in locations where the domain dimensions deviate substantially from those
formed in the bulk. The ability to pattern nonregular structures using selfassembling
materials creates new opportunities for nanoscale manufacturing.