DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kwon, UH | ko |
dc.contributor.author | Choi, SH | ko |
dc.contributor.author | Park, YH | ko |
dc.contributor.author | Lee, Won-Jong | ko |
dc.date.accessioned | 2011-08-29T04:47:22Z | - |
dc.date.available | 2011-08-29T04:47:22Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2005-03 | - |
dc.identifier.citation | THIN SOLID FILMS, v.475, no.1-2, pp.17 - 23 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | http://hdl.handle.net/10203/24996 | - |
dc.description.abstract | We present a computational study on the plasma generation and film deposition in a circular type DC magnetron sputtering system. Design optimization of a large-area magnetron sputtering system needs a precise multi-scale simulation considering a target erosion by magnetron plasma, a macrofilm deposition by collisional transport, and a micro-deposition topography by collisionless transport. Our multi-scale simulation consists of particle-in-cell and Monte Carlo collision method (PIC-MCC) magnetron plasma simulation and Monte Carlo macro/microfilm deposition simulation. Thompson energy distribution and cosine angular distribution are used for the kinetic energy distribution and for the angular flux distribution of the sputtered atoms, respectively. A variable hard sphere (VHS) model is used to calculate the collision cross section of sputtered atoms and an equi-volume rate model (EVRM) is used to represent evolving film surface. The target erosion profiles are expected from the ion current density distribution on the sputter target simulated by two-dimensional PIC-MCC magnetron plasma simulator, and these profiles are compared with the experimental results. We present a discussion about the optimum detection range for the quasi-steady state of magnetron plasma in PIC-MCC simulation. Macro/microfilm deposition simulator predicts the macrofilm uniformity over the wafer and the micro-deposition topography in the micro-holes. Finally, we present a new algorithm, which can generate an asymmetric angular flux distribution, based on Monte Carlo method for microfilm deposition simulation. (C) 2004 Elsevier B.V. All rights reserved. | - |
dc.description.sponsorship | This study has been supported by Sunic System. The authors wish to thank Professor J.P. Verboncoeur and Mr. J. Hammel of the Plasma Theory and Simulation Group of U. C. Berkeley for their kind advice about the XOOPIC program. | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | DISCHARGE | - |
dc.subject | ATOMS | - |
dc.title | Multi-scale simulation of plasma generation and film deposition in a circular type DC magnetron sputtering system | - |
dc.type | Article | - |
dc.identifier.wosid | 000227268600005 | - |
dc.identifier.scopusid | 2-s2.0-13444267561 | - |
dc.type.rims | ART | - |
dc.citation.volume | 475 | - |
dc.citation.issue | 1-2 | - |
dc.citation.beginningpage | 17 | - |
dc.citation.endingpage | 23 | - |
dc.citation.publicationname | THIN SOLID FILMS | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Lee, Won-Jong | - |
dc.contributor.nonIdAuthor | Kwon, UH | - |
dc.contributor.nonIdAuthor | Choi, SH | - |
dc.contributor.nonIdAuthor | Park, YH | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | computer simulation | - |
dc.subject.keywordAuthor | particle-in-cell | - |
dc.subject.keywordAuthor | Monte Carlo collision | - |
dc.subject.keywordAuthor | plasma processing and deposition | - |
dc.subject.keywordAuthor | sputtering | - |
dc.subject.keywordPlus | DISCHARGE | - |
dc.subject.keywordPlus | ATOMS | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.