High-k, ultrathin polymer gate insulator via initiated chemical vapor deposition (iCVD) for thin-film transistor
- Publisher
- European Materials Research Society
- Issue Date
- 2018-06-19
- Language
- English
- Citation
2018 E-MRS Spring Meeting and Exhibit
- Appears in Collection
- CBE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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