Highly Ordered Square Arrays from a Templated ABC Triblock Terpolymer

Cited 43 time in webofscience Cited 0 time in scopus
  • Hit : 63
  • Download : 0
Square-symmetry patterns are of interest in nanolithography but are not easily obtained from self-assembly of a diblock copolymer. Instead, we demonstrate highly ordered 44 nm period square patterns formed in a thin film of polyisoprene-block-polystyrene-block-polyferrocenylsilane (PI-b-PS-b-PFS) triblock terpolymer blended with 15% PS homopolymer by controlling the flint thickness, solvent anneal conditions, the surface chemistry and topography of the substrates. The square patterns consist of PFS pillars that remained after removal of the PI and PS with an oxygen plasma. On an unpatterned smooth substrate, the average grain size of the square pattern was increased dramatically to several micrometers by the use of brush layers and specific solvent anneal conditions. Templated self-assembly of well-ordered square patterns was demonstrated on substrates containing nanoscale topographical sidewalls and posts, written by electron beam lithography, in which the sidewalls and base of the substrate were independently chemically functionalized.
Publisher
AMER CHEMICAL SOC
Issue Date
2011-07
Language
English
Article Type
Article
Keywords

BLOCK-COPOLYMER LITHOGRAPHY; THIN-FILM; MORPHOLOGY; GRAPHOEPITAXY; PATTERNS; BLENDS; ORIENTATION

Citation

NANO LETTERS, v.11, no.7, pp.2849 - 2855

ISSN
1530-6984
DOI
10.1021/nl201262f
URI
http://hdl.handle.net/10203/245600
Appears in Collection
MS-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 43 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0