Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays

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Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. We demonstrate here the fabrication of aligned sub-10-nm line width patterns with a controlled orientation by using lithographically formed post arrays as templates for a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) diblock copolymer. The in-plane orientation of the block copolymer cylinders was controlled by varying the spacing and geometry of the posts, and the results were modeled using 3D self-consistent field theory. This work illustrates how arrays of narrow lines with specific in-plane orientation can be produced, and how the post height and diameter affect the self-assembly.
Publisher
AMER CHEMICAL SOC
Issue Date
2012-03
Language
English
Article Type
Article
Keywords

LITHOGRAPHY; FABRICATION; DENSITY; FILMS

Citation

ACS NANO, v.6, no.3, pp.2071 - 2077

ISSN
1936-0851
DOI
10.1021/nn203767s
URI
http://hdl.handle.net/10203/245598
Appears in Collection
MS-Journal Papers(저널논문)
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