Shape and Feature Size Control of Colloidal Crystal-Based Patterns Using Stretched Polydimethylsiloxane Replica Molds

Cited 23 time in webofscience Cited 24 time in scopus
  • Hit : 370
  • Download : 10
DC FieldValueLanguage
dc.contributor.authorChoi, Hong Kyoonko
dc.contributor.authorIm, Sang Hyukko
dc.contributor.authorPark, OOkko
dc.date.accessioned2011-06-29T02:11:27Z-
dc.date.available2011-06-29T02:11:27Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2009-10-
dc.identifier.citationLANGMUIR, v.25, no.20, pp.12011 - 12014-
dc.identifier.issn0743-7463-
dc.identifier.urihttp://hdl.handle.net/10203/24267-
dc.description.abstractIn this work, we fabricated various patterns using colloidal crystals as master molds via the soft lithography method. Even though colloidal crystals consist of spherical colloidal particles, nonspherical shaped patterns such as rectangular or elongated hexagonal shaped patterns can be fabricated using a stretched polydimethylsiloxane (PDMS) replica mold. The pattern shape and feature size can be easily controlled by changing the stretching axis and ratio of the PDMS replica mold. The deformations of the PDMS mold were Simulated using the finite element method, and they are consistent with experimental results. The elongated patterns were used as templates to offer new types of colloidal crystal superlattice structures. A proposed pattern-control method will significantly expand the usefulness and diversity of micro/nanopatterning technology.-
dc.description.sponsorshipThis work was supported by the ERC program of the Korea Science and Engineering Foundation (KOSEF) grant funded by the KoreaMinistry ofEducation, Science and Technology (MEST) (No. R11-2007-045-01002-0(2009)).en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherAMER CHEMICAL SOC-
dc.subjectNANOIMPRINT LITHOGRAPHY-
dc.subjectPLASTIC ELECTRONICS-
dc.subjectFABRICATION-
dc.subjectARRAYS-
dc.subjectPOLY(DIMETHYLSILOXANE)-
dc.subjectCHIP-
dc.titleShape and Feature Size Control of Colloidal Crystal-Based Patterns Using Stretched Polydimethylsiloxane Replica Molds-
dc.typeArticle-
dc.identifier.wosid000270594500009-
dc.identifier.scopusid2-s2.0-74949127661-
dc.type.rimsART-
dc.citation.volume25-
dc.citation.issue20-
dc.citation.beginningpage12011-
dc.citation.endingpage12014-
dc.citation.publicationnameLANGMUIR-
dc.identifier.doi10.1021/la902982y-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorPark, OOk-
dc.contributor.nonIdAuthorIm, Sang Hyuk-
dc.type.journalArticleArticle-
dc.subject.keywordPlusNANOIMPRINT LITHOGRAPHY-
dc.subject.keywordPlusPLASTIC ELECTRONICS-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusPOLY(DIMETHYLSILOXANE)-
dc.subject.keywordPlusCHIP-
Appears in Collection
CBE-Journal Papers(저널논문)
Files in This Item
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 23 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0