Two-temperature technique for plasma-enhanced chemical vapour deposition growth of silicon-nitride on InP

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Publisher
Chapman & Hall
Issue Date
1994-01
Language
English
Citation

JOURNAL OF MATERIALS SCIENCE LETTERS, v.13, pp.898 - 900

ISSN
0261-8028
URI
http://hdl.handle.net/10203/24207
Appears in Collection
PH-Journal Papers(저널논문)
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