Showing results 6 to 7 of 7
Spatial Distribution of Thin Oxide Changing in Reactive Ion Etcher and MERIE Etcher H. Shin; K. Noguchi; X. Y. Qian; N. jha; G. W. Hills; C. Hu, IEEE ELECTRON DEVICE LETTERS, v.14, no.2, pp.88 - 90, 1993-02 |
Thin Oxide Charging Current During Plasma Etching of Aluminum H. Shin; C.-C King; T. Horiuchi; C. Hu, IEEE ELECTRON DEVICE LETTERS, v.12, no.8, pp.404 - 406, 1991-08 |
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