Browse "RIMS Collection" by Title
Showing results 7201 to 7220 of 11488
| Thermally grown thin nitride films as a gate dielectric Shin, H; Choi, S; Hwang, T; Lee, Kwyro, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.33, pp.175 - 178, 1998-11 |
| Thermally Induced Electrohydrodynamic Flow of a Poorly Conducting Liquid c.o.lee; h.y.park; c.h.lee; c.y.yoo, 대한기계학회지, v.12, no.3, pp.131 - 139, 1972 |
| Thermochemical relaxation in shock tunnels Park C., 44th AIAA Aerospace Sciences Meeting 2006, pp.7013 - 7024, 2006-01-09 |
| Thermodynamic and electro-kinetic analyses of direct electron transfer (DET) and mediator-involved electron transfer (MET) with the help of a redox electron mediator Pyun, Su-Il, JOURNAL OF SOLID STATE ELECTROCHEMISTRY, v.24, no.11-12, pp.2685 - 2693, 2020-11 |
| Thermodynamic and electro-kinetic aspects of diffusion and migration (charge transfer) of electrons and holes across an n-p-type junction under bias and a photovoltaic cell under illumination Shin, Heon-Cheol; Pyun, Su-Il, JOURNAL OF SOLID STATE ELECTROCHEMISTRY, v.28, no.3-4, pp.929 - 956, 2024-03 |
| Thermodynamic aspects of energy conversion systems with focus on osmotic membrane and selectively permeable membrane (Donnan) systems including two applications of the Donnan potential Pyun, Su-Il, CHEMTEXTS, v.7, no.3, 2021-05 |
| Thermodynamic modeling of sulfate attack on carbonated Portland cement blended with blast furnace slag Seifu, Melaku N.; Kim, G. M.; Park, Seunghee; Son, H. M.; Park, Solmoi, DEVELOPMENTS IN THE BUILT ENVIRONMENT, v.15, 2023-10 |
| Thermodynamics from indistinguishability: Mitigating and amplifying the effects of the bath Latune, C. L.; Sinayskiy, I; Petruccione, F., PHYSICAL REVIEW RESEARCH, v.1, no.3, 2019-12 |
| Thermoelectric properties of 50-nm-wide n- and p- type silicon nanowires Kim, S. J.; Choi, W. C.; Zyung, T. H.; Jang, M. G., APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.120, no.1, pp.265 - 269, 2015-07 |
Thermoelectric Signal Enhancement by Reconciling the Spin Seebeck and Anomalous Nernst Effects in Ferromagnet/Non-magnet Multilayers Lee, Kyeong-Dong; Kim, Dong-Jun; Lee, Hae Yeon; Kim, Seung-Hyun; Lee, Jong-Hyun; Lee, Kyung-Min; Jeong, Jong-Ryul; et al, SCIENTIFIC REPORTS, v.5, 2015-05 |
| Thermomechanical Reliability Study of Benzocyclobutene Film in Wafer-Level Chip-Size Package Lee, K-O., JOURNAL OF ELECTRONIC MATERIALS, v.41, no.4, pp.706 - 711, 2012 |
| Thermostable phospholipase A1 mutants and a process for preparing the same Rhee, Joon Shick; Song, Jae-Kwang |
| Thickness and Other Defects on Oxide and Interface Reliability due to Plasma Processing Hyung-Cheol Shin, Proc. IEEE International Reliability Phys. Symp., pp.272 - 279, 1993 |
| Thickness-dependent magnetic domain change in epitaxial MnAs films on GaAs(001) Ryu, KS; Kim, J; Lee, Y; Akinaga, H; Manago, T; Viswan, R; Shin, Sung-Chul, APPLIED PHYSICS LETTERS, v.89, pp.389 - 395, 2006-12 |
| Thickness-dependent Magnetic Domain Structures in Epitaxial FePd Films Kim, JinBae; Choi, Jun Woo; Kim, Hyung-Jun; Cho, Sang-Geun; Kim, Jongryoul; Kim, Hyeon Seung, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.60, no.1, pp.10 - 13, 2012-01 |
| Thickness-Driven Spin Reorientation transition in ColPd(lll) : In Situ SMOKE Three-Dimensional Vector Magnetometry Lee, Jeong-Won; Kim, Sang-Koog; Kim, JG; Jeong, Jong-Ryul; Ahn, Jae-Seok; Shin, Sung-Chul, JOURNAL OF MAGNETICS, v.6, no.2, pp.53 - 56, 2001-06 |
| Thin Film Fabrication and Simultaneous Anodic Reduction of Deposited Graphene Oxide Platelets by Electrophoretic Deposition An S.J.; Zhu Y.; Lee S.H.; Stoller M.D.; Emilsson T.; Park S.; Velamakanni A.; et al, JOURNAL OF PHYSICAL CHEMISTRY LETTERS, v.1, no.8, pp.1259 - 1263, 2010 |
| Thin Film Silicon on Insulator on Insulator Substractes and Their Application to Integrated Circuits S. R. Wilson; T. Wetteroth; S. Hong; H. Shin; B-Y. Hwang; J. Foerstner; M. Racanelli; et al, JOURNAL OF ELECTRONIC MATERIALS, v.25, no.1, pp.13 - 21, 1996-01 |
| Thin gate oxide damage due to plasma processing Shin, Hyung-Cheol; Hu, CM, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.11, no.4, pp.463 - 473, 1996-04 |
| Thin Oxide Charging Current During Plasma Etching of Aluminum H. Shin; C.-C King; T. Horiuchi; C. Hu, IEEE ELECTRON DEVICE LETTERS, v.12, no.8, pp.404 - 406, 1991-08 |
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