Instability of amorphous oxide semiconductors via carrier-mediated structural transition between disorder and peroxide state

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The excited holes occupying the valence band tail (VBT) states in amorphous oxide semiconductors (AOS) are found to induce formation of meta-stable O-2(2-) peroxide defects. The VBT states are at least partly characterized by the O-O pp sigma* molecular orbital, and the localized-hole-mediated lattice instability results in the formation of the peroxide defects. Along with the O-O bond formation, the pp sigma* state is heightened up into the conduction bands, and two electrons are accordingly doped in the electronic ground state. The energy barrier from the O-2(2-) peroxide state to the normal disorder state is found to be 0.97eV in hybrid density functional theory. The hole-mediated formation of the meta-stable peroxide defects and their meta-stability is suggested as an origin of the negative bias and/or illumination stress instability in AOS.
Publisher
WILEY-V C H VERLAG GMBH
Issue Date
2012-06
Language
English
Article Type
Article
Keywords

THIN-FILM TRANSISTORS; AUGMENTED-WAVE METHOD; GA-ZN-O; BIAS STABILITY; TFTS; FABRICATION

Citation

PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, v.249, no.6, pp.1277 - 1281

ISSN
0370-1972
DOI
10.1002/pssb.201147557
URI
http://hdl.handle.net/10203/228683
Appears in Collection
PH-Journal Papers(저널논문)
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