Resistive Switching Characteristics of Al2O3 Film for Transparent Nonvolatile Memory

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Transparent resistive memory requires a transparent electrode and thin storage layer. In this letter, we highlight the importance of a dielectric and metal multilayer electrode for transparency with good flexible characteristics also. In particular, we utilized the stable properties of resistive memory obtained from an inserted thin layer near the oxide layer. The optimized thickness of the whole structure was calculated by MATLAB simulation, which followed the model of the optical transfer matrix theory. The transparent resistive memory has stable resistive switching behaviors.
Publisher
IEEE Nanotechnology Council
Issue Date
2017-11
Language
English
Article Type
Article
Citation

IEEE Transactions on Nanotechnology, v.16, no.6, pp.1129 - 1131

ISSN
1536-125X
DOI
10.1109/TNANO.2017.2723421
URI
http://hdl.handle.net/10203/228522
Appears in Collection
EE-Journal Papers(저널논문)
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