Resistive Switching Characteristics of Al2O3 Film for Transparent Nonvolatile Memory

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dc.contributor.authorKim, Myeong-Cheolko
dc.contributor.authorChoi, Kyung Cheolko
dc.date.accessioned2017-12-19T01:22:51Z-
dc.date.available2017-12-19T01:22:51Z-
dc.date.created2017-11-28-
dc.date.created2017-11-28-
dc.date.created2017-11-28-
dc.date.issued2017-11-
dc.identifier.citationIEEE Transactions on Nanotechnology, v.16, no.6, pp.1129 - 1131-
dc.identifier.issn1536-125X-
dc.identifier.urihttp://hdl.handle.net/10203/228522-
dc.description.abstractTransparent resistive memory requires a transparent electrode and thin storage layer. In this letter, we highlight the importance of a dielectric and metal multilayer electrode for transparency with good flexible characteristics also. In particular, we utilized the stable properties of resistive memory obtained from an inserted thin layer near the oxide layer. The optimized thickness of the whole structure was calculated by MATLAB simulation, which followed the model of the optical transfer matrix theory. The transparent resistive memory has stable resistive switching behaviors.-
dc.languageEnglish-
dc.publisherIEEE Nanotechnology Council-
dc.titleResistive Switching Characteristics of Al2O3 Film for Transparent Nonvolatile Memory-
dc.typeArticle-
dc.identifier.wosid000415707200031-
dc.identifier.scopusid2-s2.0-85023205800-
dc.type.rimsART-
dc.citation.volume16-
dc.citation.issue6-
dc.citation.beginningpage1129-
dc.citation.endingpage1131-
dc.citation.publicationnameIEEE Transactions on Nanotechnology-
dc.identifier.doi10.1109/TNANO.2017.2723421-
dc.contributor.localauthorChoi, Kyung Cheol-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorMemory-
dc.subject.keywordAuthormultilayer electrode-
dc.subject.keywordAuthorresistive memory-
dc.subject.keywordAuthortransparent electrode-
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