Synthesis of pseudobrookite titanium oxynitride Ti3-delta O4N films by laser chemical vapor deposition

Abstract

Pseudobrookite Ti3-delta O4N films were prepared by laser chemical vapor deposition with titanium tetrai-sopropoxide and NH3 as precursors. By increasing the deposition temperature from 964 K to 1294 K, the phase composition of the films changed from TiO2 to Ti3-delta O4N and subsequently to Ti(O,N). Ti3-delta O4N films with fine columnar grains were obtained at 1030 K and at a total chamber pressure of 0.6-0.8 kPa. The deposition rate of these films reached 7 mu m h(-1).