DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ahn, Heejoon | ko |
dc.contributor.author | Lee, Keonjae | ko |
dc.contributor.author | Shim, Anne | ko |
dc.contributor.author | Rogers, John A | ko |
dc.contributor.author | Nuzzo, Ralph G. | ko |
dc.date.accessioned | 2010-12-22T07:58:29Z | - |
dc.date.available | 2010-12-22T07:58:29Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2005-10 | - |
dc.identifier.citation | NANO LETTERS, v.5, no.12, pp.2533 - 2537 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | http://hdl.handle.net/10203/21184 | - |
dc.description.abstract | We describe a novel soft-lithographic technique possessing broad utility for the fabrication of large area, nanoscale (similar to 100 nm) multilayer resist structures on electronic material substrates. This additive patterning method transfers ultrathin poly(dimethylsiloxane) (PDMS) decals to an underlying SiO2-capped organic planarazation layer. The PDMS patterns serve as a latent image through which high-quality multilayer resist structures can be developed using reactive ion-beam etching. | - |
dc.description.sponsorship | This work was supported by the Dow Corning Corporation, the National Science Foundation (CHE 0097096), and used the facilities of the Frederick Seitz Materials Research Laboratory at the University of Illinois, which is partially supported by the Department of Energy (DEFG02-91-ER-45439). | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | Amer Chemical Soc | - |
dc.subject | NANOIMPRINT LITHOGRAPHY | - |
dc.subject | TOPOLOGICALLY COMPLEX | - |
dc.subject | IMPRINT LITHOGRAPHY | - |
dc.subject | PLASTIC ELECTRONICS | - |
dc.subject | ELASTOMERIC STAMPS | - |
dc.subject | HIGH-RESOLUTION | - |
dc.subject | PRACTICAL STEP | - |
dc.subject | FABRICATION | - |
dc.subject | MICROSTRUCTURES | - |
dc.subject | FEATURES | - |
dc.title | Additive Soft-Lithographic Patterning of Submicrometer- and Nanometer-Scale Large-Area Resists on Electronic Materials | - |
dc.title.alternative | Additive Soft-Lithographic of Patterning Submicron- and Nanometer-Scale Large-Area Resists on Electronic Materials | - |
dc.type | Article | - |
dc.identifier.wosid | 000234357000036 | - |
dc.identifier.scopusid | 2-s2.0-30644469277 | - |
dc.type.rims | ART | - |
dc.citation.volume | 5 | - |
dc.citation.issue | 12 | - |
dc.citation.beginningpage | 2533 | - |
dc.citation.endingpage | 2537 | - |
dc.citation.publicationname | NANO LETTERS | - |
dc.identifier.doi | 10.1021/nl051894u | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Lee, Keonjae | - |
dc.contributor.nonIdAuthor | Ahn, Heejoon | - |
dc.contributor.nonIdAuthor | Shim, Anne | - |
dc.contributor.nonIdAuthor | Rogers, John A | - |
dc.contributor.nonIdAuthor | Nuzzo, Ralph G. | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | NANOIMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | TOPOLOGICALLY COMPLEX | - |
dc.subject.keywordPlus | IMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | PLASTIC ELECTRONICS | - |
dc.subject.keywordPlus | ELASTOMERIC STAMPS | - |
dc.subject.keywordPlus | HIGH-RESOLUTION | - |
dc.subject.keywordPlus | PRACTICAL STEP | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | MICROSTRUCTURES | - |
dc.subject.keywordPlus | FEATURES | - |
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