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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Additive Soft-Lithographic Patterning of Submicrometer- and Nanometer-Scale Large-Area Resists on Electronic MaterialsAdditive Soft-Lithographic of Patterning Submicron- and Nanometer-Scale Large-Area Resists on Electronic Materials

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dc.contributor.authorAhn, Heejoonko
dc.contributor.authorLee, Keonjaeko
dc.contributor.authorShim, Anneko
dc.contributor.authorRogers, John Ako
dc.contributor.authorNuzzo, Ralph G.ko
dc.date.accessioned2010-12-22T07:58:29Z-
dc.date.available2010-12-22T07:58:29Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2005-10-
dc.identifier.citationNANO LETTERS, v.5, no.12, pp.2533 - 2537-
dc.identifier.issn1530-6984-
dc.identifier.urihttp://hdl.handle.net/10203/21184-
dc.description.abstractWe describe a novel soft-lithographic technique possessing broad utility for the fabrication of large area, nanoscale (similar to 100 nm) multilayer resist structures on electronic material substrates. This additive patterning method transfers ultrathin poly(dimethylsiloxane) (PDMS) decals to an underlying SiO2-capped organic planarazation layer. The PDMS patterns serve as a latent image through which high-quality multilayer resist structures can be developed using reactive ion-beam etching.-
dc.description.sponsorshipThis work was supported by the Dow Corning Corporation, the National Science Foundation (CHE 0097096), and used the facilities of the Frederick Seitz Materials Research Laboratory at the University of Illinois, which is partially supported by the Department of Energy (DEFG02-91-ER-45439).en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherAmer Chemical Soc-
dc.subjectNANOIMPRINT LITHOGRAPHY-
dc.subjectTOPOLOGICALLY COMPLEX-
dc.subjectIMPRINT LITHOGRAPHY-
dc.subjectPLASTIC ELECTRONICS-
dc.subjectELASTOMERIC STAMPS-
dc.subjectHIGH-RESOLUTION-
dc.subjectPRACTICAL STEP-
dc.subjectFABRICATION-
dc.subjectMICROSTRUCTURES-
dc.subjectFEATURES-
dc.titleAdditive Soft-Lithographic Patterning of Submicrometer- and Nanometer-Scale Large-Area Resists on Electronic Materials-
dc.title.alternativeAdditive Soft-Lithographic of Patterning Submicron- and Nanometer-Scale Large-Area Resists on Electronic Materials-
dc.typeArticle-
dc.identifier.wosid000234357000036-
dc.identifier.scopusid2-s2.0-30644469277-
dc.type.rimsART-
dc.citation.volume5-
dc.citation.issue12-
dc.citation.beginningpage2533-
dc.citation.endingpage2537-
dc.citation.publicationnameNANO LETTERS-
dc.identifier.doi10.1021/nl051894u-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorLee, Keonjae-
dc.contributor.nonIdAuthorAhn, Heejoon-
dc.contributor.nonIdAuthorShim, Anne-
dc.contributor.nonIdAuthorRogers, John A-
dc.contributor.nonIdAuthorNuzzo, Ralph G.-
dc.type.journalArticleArticle-
dc.subject.keywordPlusNANOIMPRINT LITHOGRAPHY-
dc.subject.keywordPlusTOPOLOGICALLY COMPLEX-
dc.subject.keywordPlusIMPRINT LITHOGRAPHY-
dc.subject.keywordPlusPLASTIC ELECTRONICS-
dc.subject.keywordPlusELASTOMERIC STAMPS-
dc.subject.keywordPlusHIGH-RESOLUTION-
dc.subject.keywordPlusPRACTICAL STEP-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusMICROSTRUCTURES-
dc.subject.keywordPlusFEATURES-
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