Precise study of contact resistance lowering mechanism in MoS2 FET with refined resistance network model
- Publisher
- 한국그래핀연구회
- Issue Date
- 2016-04-14
- Language
- Korean
- Citation
제3회 한국 그래핀 심포지엄
- Appears in Collection
- EE-Conference Papers(학술회의논문)
- Files in This Item
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