Precise study of contact resistance lowering mechanism in MoS2 FET with refined resistance network model

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dc.contributor.authorPark, Jihunko
dc.contributor.authorWoo, Youngjunko
dc.contributor.authorSeo, Seung Bumko
dc.contributor.authorChoi, Sung Yoolko
dc.date.accessioned2016-07-04T02:15:38Z-
dc.date.available2016-07-04T02:15:38Z-
dc.date.created2016-05-02-
dc.date.created2016-05-02-
dc.date.issued2016-04-14-
dc.identifier.citation제3회 한국 그래핀 심포지엄-
dc.identifier.urihttp://hdl.handle.net/10203/208938-
dc.languageKorean-
dc.publisher한국그래핀연구회-
dc.titlePrecise study of contact resistance lowering mechanism in MoS2 FET with refined resistance network model-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname제3회 한국 그래핀 심포지엄-
dc.identifier.conferencecountryKO-
dc.identifier.conferencelocation부여(롯데리조트)-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorChoi, Sung Yool-
dc.contributor.nonIdAuthorPark, Jihun-
dc.contributor.nonIdAuthorWoo, Youngjun-
dc.contributor.nonIdAuthorSeo, Seung Bum-
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EE-Conference Papers(학술회의논문)
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