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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Hierarchical self-assembly of block copolymers for lithography-free nanopatterning

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dc.contributor.authorKim, Bong-Hoonko
dc.contributor.authorShin, Dong-Okko
dc.contributor.authorJeong, Seong-Junko
dc.contributor.authorKoo, Chong-Minko
dc.contributor.authorJeon, Sang-Chulko
dc.contributor.authorHwang, Wook-Jungko
dc.contributor.authorLee, Su-Miko
dc.contributor.authorLee, Moon-Gyuko
dc.contributor.authorKim, Sang-Oukko
dc.date.accessioned2010-11-24T08:39:31Z-
dc.date.available2010-11-24T08:39:31Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2008-06-
dc.identifier.citationADVANCED MATERIALS, v.20, no.12, pp.2303 - 2303-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10203/20345-
dc.description.abstractHierarchical self-assembly of block copolymers has been achieved by two steps of sequential ordering processes, consisting of self-organized micropatterning from a dewetting block polymer solution and thermal annealing. The self-organized micropattern induces the spontaneous alignment of self-assembled lamellae (see figure), which is successfully applied for a lithography-free, ultra-large-scale nanopatterning.-
dc.description.sponsorshipWe thank Sung Soon Bai for providing technical support for SEM characterization. This work was supported by the Samsung Advanced Institute of Technology (SAIT), the Korea Research Foundation (KRF-2005-003-D00085), the second stage of the Brain Korea 21 Project, the Korea Science & Engineering Foundation (KOSEF) (R01-2005-000-10456-0), the Korean Ministry of Science and Technology, and the Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy. Supporting Information is available online from Wiley InterScience or from the author.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectSINGLE-LAYER FILMS-
dc.subjectTHIN-FILMS-
dc.subjectPATTERNS-
dc.subjectARRAYS-
dc.subjectSOLIDIFICATION-
dc.subjectNANOSTRUCTURE-
dc.subjectORIENTATION-
dc.subjectCYLINDERS-
dc.subjectSURFACES-
dc.titleHierarchical self-assembly of block copolymers for lithography-free nanopatterning-
dc.typeArticle-
dc.identifier.wosid000257268500010-
dc.identifier.scopusid2-s2.0-54949119540-
dc.type.rimsART-
dc.citation.volume20-
dc.citation.issue12-
dc.citation.beginningpage2303-
dc.citation.endingpage2303-
dc.citation.publicationnameADVANCED MATERIALS-
dc.identifier.doi10.1002/adma.200702285-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Sang-Ouk-
dc.contributor.nonIdAuthorJeong, Seong-Jun-
dc.contributor.nonIdAuthorKoo, Chong-Min-
dc.contributor.nonIdAuthorJeon, Sang-Chul-
dc.contributor.nonIdAuthorHwang, Wook-Jung-
dc.contributor.nonIdAuthorLee, Su-Mi-
dc.contributor.nonIdAuthorLee, Moon-Gyu-
dc.type.journalArticleArticle-
dc.subject.keywordPlusSINGLE-LAYER FILMS-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusPATTERNS-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusSOLIDIFICATION-
dc.subject.keywordPlusNANOSTRUCTURE-
dc.subject.keywordPlusORIENTATION-
dc.subject.keywordPlusCYLINDERS-
dc.subject.keywordPlusSURFACES-
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