Phase-coherent transport in catalyst-free vapor phase deposited Bi2Se3 crystals

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dc.contributor.authorOckelmann, R.ko
dc.contributor.authorMueller, A.ko
dc.contributor.authorHwang, Jin Heuiko
dc.contributor.authorJafarpisheh, S.ko
dc.contributor.authorDroegeler, M.ko
dc.contributor.authorBeschoten, B.ko
dc.contributor.authorStampfer, C.ko
dc.date.accessioned2016-04-12T07:12:11Z-
dc.date.available2016-04-12T07:12:11Z-
dc.date.created2015-09-07-
dc.date.created2015-09-07-
dc.date.created2015-09-07-
dc.date.issued2015-08-
dc.identifier.citationPHYSICAL REVIEW B, v.92, no.8-
dc.identifier.issn2469-9950-
dc.identifier.urihttp://hdl.handle.net/10203/203188-
dc.description.abstractFreestanding Bi2Se3 single-crystal flakes of variable thicknesses are grown using a catalyst-free vapor-solid synthesis and are subsequently transferred onto a clean Si++/SiO2 substrate where the flakes are contacted in Hall bar geometry. Low-temperature magnetoresistance measurements are presented which show a linear magnetoresistance for high magnetic fields and weak antilocalization (WAL) at low fields. Despite an overall strong charge-carrier tunability for thinner devices, we find that electron transport is dominated by bulk contributions for all devices. Phase-coherence lengths l(phi) as extracted from WAL measurements increase linearly with increasing electron density exceeding 1 mu m at 1.7 K. Although l(phi) is in qualitative agreement with electron-electron interaction-induced dephasing, we find that spin-flip scattering processes limit l(phi) at low temperatures.-
dc.languageEnglish-
dc.publisherAMER PHYSICAL SOC-
dc.titlePhase-coherent transport in catalyst-free vapor phase deposited Bi2Se3 crystals-
dc.typeArticle-
dc.identifier.wosid000359676600009-
dc.identifier.scopusid2-s2.0-84940062236-
dc.type.rimsART-
dc.citation.volume92-
dc.citation.issue8-
dc.citation.publicationnamePHYSICAL REVIEW B-
dc.identifier.doi10.1103/PhysRevB.92.085417-
dc.contributor.nonIdAuthorOckelmann, R.-
dc.contributor.nonIdAuthorMueller, A.-
dc.contributor.nonIdAuthorJafarpisheh, S.-
dc.contributor.nonIdAuthorDroegeler, M.-
dc.contributor.nonIdAuthorBeschoten, B.-
dc.contributor.nonIdAuthorStampfer, C.-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordPlusTOPOLOGICAL INSULATOR BI2SE3-
dc.subject.keywordPlusSINGLE DIRAC CONE-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusLINEAR MAGNETORESISTANCE-
dc.subject.keywordPlusMAJORANA FERMIONS-
dc.subject.keywordPlusBI2TE3 FILMS-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusGRAPHENE-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusNANORIBBONS-
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