Fabrication of MgB2 thin film by rf magnetron sputtering

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dc.contributor.authorAhn, JRko
dc.contributor.authorLee, SGko
dc.contributor.authorHwang, YSko
dc.contributor.authorSung, GYko
dc.contributor.authorKim, Do Kyungko
dc.date.accessioned2010-11-23T07:10:01Z-
dc.date.available2010-11-23T07:10:01Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2003-05-
dc.identifier.citationPHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, v.388, pp.127 - 128-
dc.identifier.issn0921-4534-
dc.identifier.urihttp://hdl.handle.net/10203/20291-
dc.description.abstractFabrication of superconducting MgB2 thin film on SrTiO3 and sapphire substrates by rf magnetron sputtering has been studied. We have tried both single target sputtering method using an Mg-excessive MgB2 target and co-sputtering of Mg and B. Argon sputtering pressure was 20 mTorr and 5% of hydrogen gas was added to trap the remanant oxygen gas in the deposition chamber. Films made by co-sputtering at room temperature followed by in situ annealing at 600 degreesC showed transition temperatures of about 24 K. However, those by single target sputtering or in situ co-sputtering showed either no superconducting transition or low T-c. (C) 2003 Elsevier Science B.V. All rights reserved.-
dc.description.sponsorshipThis work was supported by Korea Research Foundation Grant (KRF-2001-041-D00073) and also by KOSEF research project no. R01-2001-00038.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherELSEVIER SCIENCE BV-
dc.subjectPULSED-LASER DEPOSITION-
dc.subjectMOLECULAR-BEAM EPITAXY-
dc.titleFabrication of MgB2 thin film by rf magnetron sputtering-
dc.typeArticle-
dc.identifier.wosid000183340300057-
dc.identifier.scopusid2-s2.0-0038527303-
dc.type.rimsART-
dc.citation.volume388-
dc.citation.beginningpage127-
dc.citation.endingpage128-
dc.citation.publicationnamePHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Do Kyung-
dc.contributor.nonIdAuthorAhn, JR-
dc.contributor.nonIdAuthorLee, SG-
dc.contributor.nonIdAuthorHwang, YS-
dc.contributor.nonIdAuthorSung, GY-
dc.type.journalArticleArticle; Proceedings Paper-
dc.subject.keywordAuthorMgB2 thin film-
dc.subject.keywordAuthorsuperconducting-
dc.subject.keywordAuthorsputtering-
dc.subject.keywordPlusPULSED-LASER DEPOSITION-
dc.subject.keywordPlusMOLECULAR-BEAM EPITAXY-
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