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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Universal block copolymer lithography for metals, semiconductors, ceramics, and polymers

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dc.contributor.authorJeong, Seong-Junko
dc.contributor.authorXia, Guodongko
dc.contributor.authorKim, Bong-Hoonko
dc.contributor.authorShin, Dong-Okko
dc.contributor.authorKwon, Se-Hunko
dc.contributor.authorKim, Sang-Oukko
dc.date.accessioned2010-11-23T05:18:02Z-
dc.date.available2010-11-23T05:18:02Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2008-05-
dc.identifier.citationADVANCED MATERIALS, v.20, no.10, pp.1898 - 1898-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10203/20271-
dc.description.abstractA universal block copolymer lithography is developed for a broad spectrum of materials including metals, semiconductors, ceramics, and polymers by combining advanced film deposition techniques with block copolymer lithography. The figure presents a nanopatterned platinum film prepared by applying universal block copolymer lithography.-
dc.description.sponsorshipWe thank G. S. Kim and J.-H. Ahn for assistance with thin film depositions, and S. S. Bae for assistance with SEM analysis. This work was supported by the second stage of the Brain Korea 21 Project, the Korea Research Foundation (KRF-2005-003-D00085), the Basic Research Program of the Korea Science & Engineering Foundation (R01-2005- 000-10456-0), the Korean Ministry of Science and Technology, and the Korean Ministry of Science and Technology and Fundamental R&D Program for Core Technology of Materials funded by the Korean Ministry of Commerce, Industry and Energy. Also, this work was partially supported by grants-in-aid for the National Core Research Center Program from MOST/KOSEF (No. R15-2006-022-01001-0).en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectNANOWIRE ARRAYS-
dc.subjectFABRICATION-
dc.subjectSURFACES-
dc.subjectNANOSTRUCTURES-
dc.subjectNANOCRYSTALS-
dc.subjectCHEMISTRY-
dc.subjectISLANDS-
dc.subjectROUTES-
dc.subjectLAYERS-
dc.subjectFILMS-
dc.titleUniversal block copolymer lithography for metals, semiconductors, ceramics, and polymers-
dc.typeArticle-
dc.identifier.wosid000256846300015-
dc.identifier.scopusid2-s2.0-55049114834-
dc.type.rimsART-
dc.citation.volume20-
dc.citation.issue10-
dc.citation.beginningpage1898-
dc.citation.endingpage1898-
dc.citation.publicationnameADVANCED MATERIALS-
dc.identifier.doi10.1002/adma.200702930-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Sang-Ouk-
dc.contributor.nonIdAuthorJeong, Seong-Jun-
dc.contributor.nonIdAuthorXia, Guodong-
dc.contributor.nonIdAuthorKwon, Se-Hun-
dc.type.journalArticleArticle-
dc.subject.keywordPlusNANOWIRE ARRAYS-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusSURFACES-
dc.subject.keywordPlusNANOSTRUCTURES-
dc.subject.keywordPlusNANOCRYSTALS-
dc.subject.keywordPlusCHEMISTRY-
dc.subject.keywordPlusISLANDS-
dc.subject.keywordPlusROUTES-
dc.subject.keywordPlusLAYERS-
dc.subject.keywordPlusFILMS-
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