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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| EFFECTS OF DEPOSITION TEMPERATURE ON THE ELECTRICAL-PROPERTIES OF ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION TA2O5 FILM AND THE FORMATION OF INTERFACIAL SIO2 KIM, I; KIM, JS; CHO, BW; AHN, SD; Chun , Soung Soon; Lee, Won-Jong, JOURNAL OF MATERIALS RESEARCH, v.10, no.11, pp.2864 - 2869, 1995-11 | |
| EFFECTS OF ANNEALING IN O-2 AND N-2 ON THE ELECTRICAL-PROPERTIES OF TANTALUM OXIDE THIN-FILMS PREPARED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION Kim, IL; Kim, Jong-Seok; Kwon, Oh-Seung; Ahn, Sung-Tae; Chun , Soung Soon; Lee, Won-Jong, JOURNAL OF ELECTRONIC MATERIALS, v.24, no.10, pp.1435 - 1441, 1995-10 | |
| CHARACTERIZATION OF PBTIO3 THIN-FILMS DEPOSITED ON PT/TI/SIO2/SI SUBSTRATES BY ECR PECVD CHUNG, SW; SHIN, JS; KIM, JW; No, Kwangsoo; Chun , Soung Soon; Lee, Won-Jong, JOURNAL OF MATERIALS RESEARCH, v.10, no.2, pp.447 - 452, 1995-02 |
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