Browse "RIMS Journal Papers" by Author G. W. Hills
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| Plasma Etching Charge-up Damage to Thin Oxides H. Shin; N. jha; X. Y. Qian; G. W. Hills; C. Hu, SOLID STATE TECHNOLOGY, v.36, no.8, pp.29 - 36, 1993-08 |
| Spatial Distribution of Thin Oxide Changing in Reactive Ion Etcher and MERIE Etcher H. Shin; K. Noguchi; X. Y. Qian; N. jha; G. W. Hills; C. Hu, IEEE ELECTRON DEVICE LETTERS, v.14, no.2, pp.88 - 90, 1993-02 |
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