Browse "RIMS Journal Papers" by Author H. Shin
Showing results 6 to 8 of 8
| Spatial Distribution of Thin Oxide Changing in Reactive Ion Etcher and MERIE Etcher H. Shin; K. Noguchi; X. Y. Qian; N. jha; G. W. Hills; C. Hu, IEEE ELECTRON DEVICE LETTERS, v.14, no.2, pp.88 - 90, 1993-02 |
| Thin Film Silicon on Insulator on Insulator Substractes and Their Application to Integrated Circuits S. R. Wilson; T. Wetteroth; S. Hong; H. Shin; B-Y. Hwang; J. Foerstner; M. Racanelli; et al, JOURNAL OF ELECTRONIC MATERIALS, v.25, no.1, pp.13 - 21, 1996-01 |
| Thin Oxide Charging Current During Plasma Etching of Aluminum H. Shin; C.-C King; T. Horiuchi; C. Hu, IEEE ELECTRON DEVICE LETTERS, v.12, no.8, pp.404 - 406, 1991-08 |
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