Showing results 1 to 5 of 5
A new low-resistance antifuse with planar metal/dielectric/poly-Si/dielectric/metal structure Baek, JT; Chung, SH; Kang, SW; Ahn, Byung Tae; Yoo, Hyung Joun, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.3B, pp.1642 - 1645, 1997-03 |
Characterization of anhydrous HF gas-phase etching with CH3OH for sacrificial oxide removal Lee, JH; Jang, WI; Lee, CS; Il Lee, Y; Choi, CA; Baek, JT; Yoo, Hyung Joun, SENSORS AND ACTUATORS A-PHYSICAL, v.64, no.1, pp.27 - 32, 1998-01 |
Growth behavior of copper metalorganic chemical vapor deposition using the (hfac)Cu(VTMOS) precursor on titanium nitride substrates Jun, CH; Kim, YT; Baek, JT; Yoo, Hyung Joun; Kim, DR, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.6, pp.3214 - 3219, 1996 |
Modeling and characterization of gas-phase etching of thermal oxide and TEOS oxide using anhydrous HF and CH3OH Lee, CS; Baek, JT; Yoo, Hyung Joun; Woo, Seong-Ihl, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.3, pp.1099 - 1103, 1996-03 |
TiN barrier layer formation by the two-step rapid thermal conversion process Kim, YT; Jun, CH; Lee, JH; Baek, JT; Joun, H; Yoo, Hyung Joun, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.6, pp.3245 - 3251, 1996 |
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