Browse "School of Electrical Engineering(전기및전자공학부)" by Author Yoo, WJ
Showing results 1 to 10 of 10
| Damage free etching of RuO2 in O2/He plasma Cho, Byung Jin; Hwang, WS; Bliznetsov, VN; Chan, DSH; Yoo, WJ, 28th International Symposium on Dry Process, pp.0 - 0, 2006-11-29 |
| Effects of Cu diffusion on MOSFET electrical properties Cho, Byung Jin; Zhu, C; Yoo, WJ; Tan, DPP; Lim, SY, 18th International VLSI Multilevel Interconnection Conf. (VMIC), pp.0 - 0, 2001-11-28 |
| Effects of Low Energy Nitrogen Plasma on the Removal of HfSiON Cho, Byung Jin; Hwang, WS; Yoo, WJ; Chan, DSH, AVS 53rd International Symposium, pp.0 - 0, 2006-11-12 |
| Effects of SiO2/Si3N4 hard masks on etching properties of metal gates Hwang, WS; Cho, Byung Jin; Chan, DSH; Bliznetsov, V; Yoo, WJ, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.24, no.6, pp.2689 - 2694, 2006-11 |
| Electrical Properties of CMOS Devices with Cu Local Interconnects Cho, Byung Jin; Xie, H; Yoo, WJ; Zhu, C; Lim, SY; Tan, D; Lai, D, 8th International Conference on Dielectrics & Conductors for ULSI Multilevel Interconnection (DCMIC), pp.0 - 0, 2002-02-25 |
| Endurance reliability of multilevel-cell flash memory using a ZrO2/Si3N4 dual charge storage layer Zhang, G; Hwang, WS; Lee, SH; Cho, Byung Jin; Yoo, WJ, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.55, no.9, pp.2361 - 2369, 2008-09 |
| Low energy N-2 ion bombardment for removal of (HfO2)(x)(SiON)(1-x) in dilute HF Hwang, WS; Cho, Byung Jin; Chan, DSH; Yoo, WJ, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.25, no.4, pp.1056 - 1061, 2007-07 |
| New Substrate Platform for Metal-Gate/High-k Gate Dielectric MOSFET Integration and RF Technology up to 100 GHz Cho, Byung Jin; Chin, A; Mei, P; Zhu, C; Li, MF; Lee, S; Yoo, WJ, Advanced Crystal Growth Conference and 2003 International Symposium on Substrate Engineering, pp.0 - 0, 2003-11-13 |
| Novel ZrO2/Si3N4 Dual Charge Storage Layer to Form Step-Up Potential Wells for Highly Reliable Multi-Level Cell Application Cho, Byung Jin; Zhang, G; Hwang, WS; Bobade, SM; Lee, SH; Yoo, WJ, International Electron Device Meeting (IEDM) 2007, pp.0 - 0, 2007-12-01 |
| Study on nonvolatile byproducts generated during etching of advanced gate stacks Cho, Byung Jin; Hwang, WS; Chan, DSH; Yoo, WJ, 28th International Symposium on Dry Process, pp.0 - 0, 2006-11-29 |
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