Showing results 8 to 14 of 14
Improvement of dielectric properties by inserting oxygen-rich initial layer in Pt/(Ba,Sr)TiO3/Pt structure Kwak, DH; Lee, SH; Jang, BT; Cha, SY; Lee, Hee Chul, INTEGRATED FERROELECTRICS, v.20, no.1-4, pp.205 - 214, 1998 |
Iridium Thin Film as a Bottom Electrode for High Dielectric (Ba,Sr)TiO3 Capacitors Lee, Hee Chul; Cha, SY; Jang, BT; Kwak, KH; Shin, CH, 9th International Symposium on Integrated Ferroelectrics, 1997 |
Iridium thin film as a bottom electrode for high dielectric (Ba,Sr)TiO3 capacitors Cha, SY; Jang, BT; Kwak, DH; Shin, CH; Lee, Hee Chul, INTEGRATED FERROELECTRICS, v.17, no.1-4, pp.187 - 195, 1997 |
Platinum Bottom Electrode Formed by Electron Beam Evaporation for High Dielectric Thin Films Kim, Ho Gi; Lee, Hee Chul; Cha, SY; Lee, WJ, 12th Conf. on Ferro. Mat. and Their Appl. 1995, pp.93 - 95, 1995-01-01 |
Reactive Ion Beam Etching of Ir Bottom Electrode for High Dielectric (Ba,Sr)TiO3 Capacitor Integration Lee, Hee Chul; Cha, SY; Kim, DH; Jang, BT; Kwak, DH, The 9th International Meeting on Ferroelectricity, pp.0 - 0, 1997-08-01 |
The Post-Annealing Effect on the Electrical Properties of SrBi2Ta2O9 Thin film by Sol-gel Method Lee, Hee Chul; Shin, CH; Jang, BT; Cha, SY; Kwak, DH, The 9th International Meeting on Ferroelectricity, pp.0 - 0, 1997-08-01 |
Ti thickness effects in Pt/Ti bottom electrode on properties of (Ba,Sr)TiO3 thin film Cha, SY; Lee, SH; Lee, Hee Chul, INTEGRATED FERROELECTRICS, v.16, no.1-4, pp.183 - 190, 1997 |
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