Browse "School of Electrical Engineering(전기및전자공학부)" by Title 

Showing results 15801 to 15820 of 51489

15801
Effect of gain expansion of MMIC power amplifier for high order modulation OFDM portable system

Kim, J.H.; Jeong, J.H.; Kim, S.M.; Kim, J.H.; Park, Chul Soon; Lee, K.C., IEEE MITT-S International Microwave Symposium Digest, 2004, v.2, no.0, pp.1169 - 1172, IEEE MTT-S IMS 2004, 2004-06-06

15802
Effect of Generalized-K Fading on the Performance of Symmetric Coordinate Interleaved Orthogonal Designs

Yoon, Chanho; Lee, Hoojin; Kang, Joonhyuk, IEEE COMMUNICATIONS LETTERS, v.18, no.4, pp.588 - 591, 2014-04

15803
Effect of Gold Nanorods in an MgO Protective Layer of AC Plasma Display Panels

Cho, Seok Ho; Lee, Seong-Min; Kim, Woo Hyun; Choi, Kyung-Cheol, ACS APPLIED MATERIALS INTERFACES, v.7, no.14, pp.7559 - 7565, 2015-04

15804
Effect of grain size and interlayer on stretchability of thin metal films

한승석; 이정용, 2019년 한국태양광발전학회 추계학술대회, 한국태양광발전학회, 2019-11-21

15805
Effect of ground guard fence with via and ground slot on radiated emission in multi-layer digital printed circuit board

Lee, H.; Kim, J.; Ahn, S.; Byun, J.-G.; Kang, D.-S.; Choi, C.-S.; Hwang, H.-J.; et al, 2001 IEEE International Symposium on Electromagnetic Compatibility, v.1, pp.653 - 656, IEEE, 2001-08-13

15806
Effect of Handoff Region on CDMA Reverse Links

Sung, Dan Keun; Shin, SM; Lee, KJ; Lee, H, MDMC, pp.1 -, 1994

15807
Effect of helium addition on discharge characteristics in a flat fluorescent lamp

Lee, SE; Lee, HN; Park, HB; Lee, KS; Choi, Kyung Cheol, JOURNAL OF APPLIED PHYSICS, v.98, pp.869 - 888, 2005-11

15808
Effect of high pressure anneal on switching dynamics of ferroelectric hafnium zirconium oxide capacitors

Buyantogtokh, Batzorig; Gaddam, Venkateswarlu; Jeon, Sanghun, JOURNAL OF APPLIED PHYSICS, v.129, no.24, 2021-06

15809
Effect of High Pressure Annealing Temperature on the Ferroelectric Properties of TiN/Hf0.25Zr0.75O2/TiN Capacitors

Jeon, Sanghun; Das, Dipjyoti; Gaddam, Venkateswarlu, 4th Electron Devices Technology and Manufacturing Conference, EDTM 2020, IEEE, 2020-03

15810
Effect of Hydrogen Annealing on Contact Resistance Improvement of Screen-printed Thermoelectric Thick Films

Kim, Yongjun; Kim, Sun Jin; Choi, Hyeongdo; Kim, Choong Sun; Lee, Gyu Soup; Shin, Ji Seion; Yi, Kyung Soo; et al, Materials Challenges in Alternative & Renewable Energy 2017, The Korean Institute of Chemical Engineers, 2017-02-24

15811
Effect of Hydrogen Annealing on Contact Resistance Reduction of Metal-Interlayer-n-Germanium Source/Drain Structure

Kim, Gwang-Sik; Yoo, Gwangwe; Seo, Yujin; Kim, Seung-Hwan; Cho, Karam; Cho, Byung-Jin; Shin, Changhwan; et al, IEEE ELECTRON DEVICE LETTERS, v.37, no.6, pp.709 - 712, 2016-06

15812
Effect of hydrogen dilution on carrier transport in hydrogenated boron-doped nanocrystalline silicon-silicon carbide alloys

Myong, SY; Lim, Koeng Su; Konagai, M, APPLIED PHYSICS LETTERS, v.88, pp.228 - 236, 2006-03

15813
Effect of hydrogen on dynamic charge transport in amorphous oxide thin film transistors

Kim, Taeho; Nam, Yunyong; Hur, Ji-Hyun; Park, Sang-Hee Ko; Jeon, Sanghun, NANOTECHNOLOGY, v.27, no.32, 2016-08

15814
Effect of Hydrogen on Hafnium Zirconium Oxide Fabricated by Atomic Layer Deposition Using H2O2 Oxidant

Kim, Hyoungkyu; Yun, Seokjung; Kim, Tae Ho; Kim, Hoon; Bae, Changdeuck; Jeon, Sanghun; Hong, Seungbum, PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v.15, no.5, 2021-05

15815
Effect of implantation-induced disorder on the structural and optical properties of vacuum evaporated Cd0.96Zn0.04Te Thin Films

Lee, Hee Chul, ASIP-2002, pp.0 - 0, 2002-08-01

15816
Effect of in-situ P doped polysilicon on gate oxide (I) - yield degradation

Cho, Byung Jin; Lim, JU; Park, YJ; Kim, JC; Choi, SH, 41st Spring Meeting of the Japan Society of Applied Physics and Related Societies, pp.664 - 664, 1994-03-28

15817
Effect of in-situ P doped polysilicon on gate oxide (II) - Process condition dependence

Cho, Byung Jin; Lim, JU; Park, YJ; Kim, JC; Choi, SH, 41st Spring Meeting of the Japan Society of Applied Physics and Related Societies, pp.664 - 664, 1994-03-28

15818
Effect of Insertion of Dielectric Layer on the Performance of Hafnia Ferroelectric Devices

Hwang, Junghyeon; Goh, Youngin; Jeon, Sanghun, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.68, no.2, pp.841 - 845, 2021-02

15819
Effect of ion implantation on the structural and optical properties of thermally evaporated Cd1-xZnxTe thin films

Sridharan, M.; Lee, Hee Chul; Narayandass, Sa.K.; Mangalaraj, D., Physics of Semiconductor Devices, pp.1228 - 1231, 2001-12-11

15820
Effect of Kr and Ar on discharge time lag and image retention in AC plasma display panel with high Xe content

Kim, S.H.; Choi, K.C.; Shin, B.J.; Choi, Kyung Cheol; Yoo, E.-H., IDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005, no.2, pp.1555 - 1558, 2005-12-06

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