Selective Sintering of Metal Nanoparticle Ink for Maskless Fabrication of an Electrode Micropattern Using a Spatially Modulated Laser Beam by a Digital Micromirror Device

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dc.contributor.authorAn, Kunsikko
dc.contributor.authorHong, Sukjoonko
dc.contributor.authorHan, Seungyongko
dc.contributor.authorLee, Hyungmanko
dc.contributor.authorYeo, Junyeobko
dc.contributor.authorKo, Seung Hwanko
dc.date.accessioned2014-08-29T01:54:50Z-
dc.date.available2014-08-29T01:54:50Z-
dc.date.created2014-04-22-
dc.date.created2014-04-22-
dc.date.issued2014-02-
dc.identifier.citationACS APPLIED MATERIALS & INTERFACES, v.6, no.4, pp.2785 - 2789-
dc.identifier.issn1944-8244-
dc.identifier.urihttp://hdl.handle.net/10203/188893-
dc.description.abstractWe demonstrate selective laser sintering of silver (Ag) nanoparticle (NP) ink using a digital micromirror device (DMD) for the facile fabrication of 2D electrode pattern without any conventional lithographic means or scanning procedure. An arbitrary 2D pattern at the lateral size of 25 mu m X 25 mu m with 160 nm height is readily produced on a glass substrate by a short exposure of 532 nm Nd:YAG continuous wave laser. The resultant metal pattern exhibits low electrical resistivity of 10.8 u Omega.cm and also shows a fine edge sharpness by the virtue of low thermal conductivity of Ag NP ink. Furthermore, 10 X 10 star-shaped micropattern arrays are fabricated through a step-and-repeat scheme to ensure the potential of this process for the large-area metal pattern fabrication.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.subjectTHERMAL-CONDUCTIVITY-
dc.subjectHIGH-RESOLUTION-
dc.subjectDISPLAYS-
dc.titleSelective Sintering of Metal Nanoparticle Ink for Maskless Fabrication of an Electrode Micropattern Using a Spatially Modulated Laser Beam by a Digital Micromirror Device-
dc.typeArticle-
dc.identifier.wosid000332144600077-
dc.identifier.scopusid2-s2.0-84896835781-
dc.type.rimsART-
dc.citation.volume6-
dc.citation.issue4-
dc.citation.beginningpage2785-
dc.citation.endingpage2789-
dc.citation.publicationnameACS APPLIED MATERIALS & INTERFACES-
dc.identifier.doi10.1021/am405323c-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorLee, Hyungman-
dc.contributor.nonIdAuthorAn, Kunsik-
dc.contributor.nonIdAuthorHong, Sukjoon-
dc.contributor.nonIdAuthorHan, Seungyong-
dc.contributor.nonIdAuthorYeo, Junyeob-
dc.contributor.nonIdAuthorKo, Seung Hwan-
dc.type.journalArticleArticle-
dc.subject.keywordAuthordigital micromirror device-
dc.subject.keywordAuthornanoparticle ink-
dc.subject.keywordAuthornanoparticle laser sintering-
dc.subject.keywordAuthornonvacuum environment-
dc.subject.keywordAuthorlow temperature metal thin film patterning-
dc.subject.keywordPlusTHERMAL-CONDUCTIVITY-
dc.subject.keywordPlusHIGH-RESOLUTION-
dc.subject.keywordPlusDISPLAYS-
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