Development of substrate-buried thick-metal process based on anodized aluminum substrate and its applications to RF passive devices양극산화 알루미늄 기판 기반의 기판 내장형 후막 금속 공정 개발 및 RF 수동 소자에의 응용

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dc.contributor.advisorHong, Song-Cheol-
dc.contributor.advisor홍성철-
dc.contributor.authorKim, Cheol-Ho-
dc.contributor.author김철호-
dc.date.accessioned2013-09-11T05:15:22Z-
dc.date.available2013-09-11T05:15:22Z-
dc.date.issued2012-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=486658&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/180218-
dc.description학위논문(박사) - 한국과학기술원 : 전기 및 전자공학과, 2012.2, [ iii, 82 p. ]-
dc.languageeng -
dc.publisher한국과학기술원-
dc.subjectanodized aluminum substrate-
dc.subjectSystem-on-Package (SOP)-
dc.subjectburied thick metal-
dc.subjecthigh-Q inductor-
dc.subject시스템 온 패키지-
dc.subject양극산화 알루미늄 기판-
dc.subject내장형 후막 금속-
dc.subject고품질 인덕터-
dc.subject집적 트랜스포머-
dc.subjectintegrated transformer-
dc.titleDevelopment of substrate-buried thick-metal process based on anodized aluminum substrate and its applications to RF passive devices-
dc.title.alternative양극산화 알루미늄 기판 기반의 기판 내장형 후막 금속 공정 개발 및 RF 수동 소자에의 응용-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN486658/325007 -
dc.description.department한국과학기술원 : 전기 및 전자공학과, -
dc.identifier.uid020065050-
dc.contributor.localauthorHong, Song-Cheol-
dc.contributor.localauthor홍성철-
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EE-Theses_Ph.D.(박사논문)
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