Showing results 1 to 4 of 4
Conformable Solid-Index Phase Masks Composed of High-Aspect-Ratio Micropillar Arrays and Their Application to 3D Nanopatterning Park, Junyong; Park, Jae Hong; Kim, Eunhye; Ahn, Chi Won; Jang, Hyun Ik; Rogers, John A.; Jeon, Seokwoo, ADVANCED MATERIALS, v.23, no.7, pp.860 - 864, 2011-02 |
Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning Park, Junyong; Tahk, Dongha; Ahn, Changui; Im, SungGap; Choi, Se-Jin; Suh, Khap-Yang; Jeon, Seokwoo, JOURNAL OF MATERIALS CHEMISTRY C, v.2, no.13, pp.2316 - 2322, 2014-01 |
Fabricating three dimensional nanostructures using two photon lithography in a single exposure step Jeon, Seokwoo; Malyarchuk, V; Rogers, JA; Wiederrecht, GP, OPTICS EXPRESS, v.14, no.6, pp.2300 - 2308, 2006-03 |
Masterless soft lithography: Patterning UV/ozone-induced adhesion on poly(dimethylsiloxane) surfaces Childs, WR; Motala, MJ; Lee, Keonjae; Nuzzo, RG, LANGMUIR, v.21, no.22, pp.10096 - 10105, 2005-10 |
Discover