Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning

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The pattern resolution of soft lithographic techniques is critically determined by the elastic modulus of the soft mold that can support fine and high-aspect-ratio features with conformal adhesion to target substrates. We present a strategy to fine-tune the elastic modulus of conformal molds made of polyurethane acrylate by optimizing the chemical structures and the composition of prepolymer and modulator. Trimethylolpropane ethoxylated (15) triacrylate plays a key role as a delicate modulator for increasing the elastic modulus of soft aliphatic urethane diacrylate oligomer with its low cross-linking density. The optimized molds have sufficiently high elastic modulus (>23 MPa) for defect-free replication of dense, high-aspect-ratio (>2) nanopillars and nanotrench structures while still preserving their conformality. The conformal mold with good mechanical and optical properties can serve as a semi-permanently usable optical phase mask with a wide range of phase modulations for generating three-dimensional (3D) nanostructures with high precision.
Publisher
ROYAL SOC CHEMISTRY
Issue Date
2014-01
Language
English
Article Type
Article
Keywords

3-DIMENSIONAL NANOSTRUCTURES; SOFT LITHOGRAPHY; STAMPS; MOLD; RESOLUTION; ABSORPTION; COLLAPSE; FEATURES; ARRAYS; STEP

Citation

JOURNAL OF MATERIALS CHEMISTRY C, v.2, no.13, pp.2316 - 2322

ISSN
2050-7526
DOI
10.1039/c3tc32194k
URI
http://hdl.handle.net/10203/188905
Appears in Collection
CBE-Journal Papers(저널논문)MS-Journal Papers(저널논문)
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